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Highly hydroxylated hafnium clusters are accessible to high resolution EUV photoresists under small energy doses

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Advances in metal-based photoresist materials for EUV lithography and lithographic mechanisms

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Etchant‐Free Dry‐Developable Extreme Ultraviolet Photoresist Materials Utilizing N‐Heterocyclic Carbene–Metal Complexes

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Halogenated Metal‐Organic Clusters for High‐Resolution Extreme Ultraviolet Lithography Resists†

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Bismuth-oxo Clusters for Next Generation Extreme Ultraviolet Light Photolithography

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Trinuclear Tin Complexes for Advanced Lithography: Sensitivity Enhancement via the Synergistic Effect in Dual Cross-Linking Systems

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Pioneering Carboxylated Zirconium Oxo Cluster Resist for Precision Nanoscale Patterning

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Enhanced Edge Etching Resistance and EUV Lithographic Performance of a Tin-Oxide Photoresist via a Blend Strategy

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Selenite‐Directed Organotin–Oxo Macrocycles for Nanolithography

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Improving the Lithographic Performance of Tetranuclear Organotin Resist via Additives with Active Ligands†

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Additive-Assisted Forming High-Quality Thin Films of Sn–Oxo Cluster for Nanopatterning

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Si-Containing Reverse-Gradient Block Copolymer for Inorganic Pattern Amplification in EUV Lithography

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Transmission Electron Microscopy Unraveled Ionic Oxygen-Affinity Engineering of Metal Oxo Clusters with Extreme Ultraviolet Lithography Activity

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Atomically Precise Interfacial Engineering on Tin‐Silicon Oxo Clusters for Sub‐8 nm Lithography

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Layer-Ordered Organooxotin Clusters for Extreme-Ultraviolet Photolithography

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Recent Progress of Nonchemically‐Amplified Resists for High‐Resolution Lithography†

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Radiation chemistry of a novel zinc–oxo cluster crosslinking strategy for EUV patterning

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Sub‐10‐nm Lithography for Sn4–Oxo Clusters: Effect of Molecular Polarity on Sensitivity and Resolution

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Single Rare-Earth Ion Doped Tin-Oxo Nanocluster Photoresists for High-Resolution Extreme Ultraviolet Lithography

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Reaction mechanisms of Sn-based polarity-change copolymer resists with different counter anions, designed for extreme ultraviolet lithography

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Atomically Precise Interfacial Engineering on Tin‐Silicon Oxo Clusters for Sub‐8 nm Lithography

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Novel Stannoxane-based cage: Development, biological activity, computational and DNA interaction studies

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High-sensitivity extreme ultraviolet photoresists based on heteroleptic Sn complexes

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