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Positive Role of Iodine Atoms in Chemically Amplified Photoresists for Extreme Ultraviolet Lithography

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Design and structure-property relationship of highly efficient photo-acid generators for high-resolution patternable coatings

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Microelectrode Arrays for Simultaneous Electrophysiology and Advanced Optical Microscopy

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Photolithographic patterning of PEDOT:PSS with a silver interlayer and its application in organic light emitting diodes

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Orthogonal Processing: A Novel Photolithographic Patterning Method for Organic Electronics

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Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating

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Kinetic Isotope Effects Provide Experimental Evidence for Proton Tunneling in Methylammonium Lead Triiodide Perovskites

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Hybrid strategies in nanolithography

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Water‐Vapor‐Assisted Nanoimprinting of PEDOT:PSS Thin Films

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Dendritic Polyphenol with an Improved Glass Transition Temperature for Microelectronic Applications

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Regioisomeric effects regulating the physicochemical properties of complex copolymers in thin films

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Tin‐Oxo Nanocluster Extreme UV Photoresists Equipped with Chemical Features for Atmospheric Stability and High EUV Sensitivity

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Progress toward a liquid crystal contact lens display

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