Issue 4, 2023

An innovative S-scheme PhC2Cu/Ag/Ag2MoO4 photocatalyst for efficient degradation of sulfamethazine antibiotics: heterojunctions and innergenerated-H2O2 promote radical production

Abstract

Copper-phenylacetylide (PhC2Cu) is a promising candidate for photocatalysis. Herein, an S-scheme heterojunction of PhC2Cu/Ag/Ag2MoO4 (PAM) photocatalyst was synthesized for the effective and stable photocatalytic reduction of sulfamethazine (SMT) under blue LED light. In the optimal PAM40 system, the kinetic rate constant for the degradation of SMT was 0.1622 min−1, which was 16.3 times that of PhC2Cu (0.0099 min−1). The enhanced photocatalytic performance was attributed to efficient photoexcited charge separation, higher innergenerated-H2O2 and greater oxidation–reduction capacities for the generation of reactive oxygen species (ROS). The potential photocatalytic mechanism of the S-scheme PAM40 was elucidated through relevant characterization and experimental investigations, which confirmed the existence of an internal electric field (IEF), which promoted photocarrier separation and transport. The SMT degradation pathways were proposed, and the developmental toxicities of the intermediates were predicted. Moreover, this work compounded the materials with innergenerated-H2O2 capability (PhC2Cu) and with H2O2 catalytic capability (Ag2MoO4), which provides an innovative perspective for the synthesis of S-scheme heterojunction photocatalysts with superior activities.

Graphical abstract: An innovative S-scheme PhC2Cu/Ag/Ag2MoO4 photocatalyst for efficient degradation of sulfamethazine antibiotics: heterojunctions and innergenerated-H2O2 promote radical production

Supplementary files

Article information

Article type
Paper
Submitted
09 بهمن 1401
Accepted
01 فروردین 1402
First published
02 فروردین 1402

Environ. Sci.: Nano, 2023,10, 1053-1064

An innovative S-scheme PhC2Cu/Ag/Ag2MoO4 photocatalyst for efficient degradation of sulfamethazine antibiotics: heterojunctions and innergenerated-H2O2 promote radical production

D. Liang, Z. Lin, Y. Wu, D. Li, J. Chen, X. Jin, Y. Chen, J. Zhang, H. Liu, P. Chen, W. Lv and G. Liu, Environ. Sci.: Nano, 2023, 10, 1053 DOI: 10.1039/D3EN00056G

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