Jiang Jing, Benoît Heinrich, Alexis Prel, Emilie Steveler, Tianyan Han, Ibrahim Bulut, Stéphane Méry, Yann Leroy, Nicolas Leclerc, Patrick Lévêque, Martin Rosenthal, Dimitri A. Ivanov and Thomas Heiser
J. Mater. Chem. A, 2021, 9, 24315
DOI: 10.1039/D1TA06300F
Shaimaa H. Mallah, Cihat Güleryüz, Sajjad H. Sumrra, Abrar U. Hassan, Hasan Güleryüz, Ayesha Mohyuddin, Hussein A.K. Kyhoiesh, Sadaf Noreen and Ashraf Y. Elnaggar
Materials Science in Semiconductor Processing, 2025, 190, 109331
DOI: 10.1016/j.mssp.2025.109331
Gyeong G. Jeon, Jinseck Kim, Hyeong Ju Eun, Jong-Woon Ha, Sein Chung, So Jeong Shin, Kilwon Cho, Sung Cheol Yoon, Bumjoon J. Kim, Seo-Jin Ko and Jong H. Kim
Chemical Engineering Journal, 2024, 495, 153419
DOI: 10.1016/j.cej.2024.153419
A. Vázquez, A. Castro-Carranza, M. Rodríguez, J.L. Maldonado, A. Castro-Chacón, L. García-González, J. Hernández-Torres, J. Martínez-Castillo, L. Zamora-Peredo, J. Gutowski and J.C. Nolasco
Hussein A. K. Kyhoiesh, Azal S. Waheeb, Karrar H. Salem, Waleed M. Khazaal, Amasee F. Jabbar, Ahmed A. Al‐Kubaisi, Ashraf Y. Elnaggar, Islam H. El Azab and Mohamed H. H. Mahmoud
Carr Hoi Yi Ho, Yusen Pei, Yunpeng Qin, Chujun Zhang, Zhengxing Peng, Indunil Angunawela, Austin L. Jones, Hang Yin, Hamna F. Iqbal, John R. Reynolds, Kenan Gundogdu, Harald Ade, Shu Kong So and Franky So
Obaid Alqahtani, Seyed Mehrdad Hosseini, Thomas Ferron, Victor Murcia, Terry McAfee, Kevin Vixie, Fei Huang, Ardalan Armin, Safa Shoaee and Brian A. Collins
Ignacio A. Jessop, Josefa Cutipa, Yasmín Perez, Cesar Saldías, Denis Fuentealba, Alain Tundidor-Camba, Claudio A. Terraza, María B. Camarada and Felipe A. Angel
Bomi Kim, Yang‐Soo Lee, DuHyeon Um, Won Jeong, Seul Lee, Kwangmin Kim, GyuMin Nam, Hyegyeong Hwang, SuHyun Kim, Taeyoon Kim, Kwanghee Lee, Hongkyu Kang and BongSoo Kim