van der Waals integration of AZO/MoS2 ohmic junctions toward high-performance transparent 2D electronics

Tao Guo, Hao Wu, Xue Chen, Qi Tang, Jiaxian Wan, Quanbing Guo, Shuangfeng Jia and Chang Liu

J. Mater. Chem. C, 2020, 8, 9960
DOI: 10.1039/D0TC02166K

The use of atomic layer deposition in advanced nanopatterning

A. J. M. Mackus, A. A. Bol and W. M. M. Kessels

Nanoscale, 2014, 6, 10941
DOI: 10.1039/C4NR01954G

Surface mobility and impact of precursor dosing during atomic layer deposition of platinum:in situmonitoring of nucleation and island growth

Jolien Dendooven, Michiel Van Daele, Eduardo Solano, Ranjith K. Ramachandran, Matthias M. Minjauw, Andrea Resta, Alina Vlad, Yves Garreau, Alessandro Coati, Giuseppe Portale and Christophe Detavernier

Phys. Chem. Chem. Phys., 2020, 22, 24917
DOI: 10.1039/D0CP03563G

Synthesis of core/shell structured Pd3Au@Pt/C with enhanced electrocatalytic activity by regioselective atomic layer deposition combined with a wet chemical method

Huiyuan Liu, Yujiang Song, Shushuang Li, Jia Li, Yuan Liu, Ying-Bing Jiang and Xinwen Guo

RSC Adv., 2016, 6, 66712
DOI: 10.1039/C6RA04990G

Nanoscale selective area atomic layer deposition of TiO2using e-beam patterned polymers

Ali Haider, Mehmet Yilmaz, Petro Deminskyi, Hamit Eren and Necmi Biyikli

RSC Adv., 2016, 6, 106109
DOI: 10.1039/C6RA23923D

Morphable architected materials with topologically variable and volumetric reconfiguration

Kai Xiao, Yuhao Wang, Chao Song, Bihui Zou, Zihe Liang, Heeseung Han, Qinyun Ding, Yilin Du, Shane Johnson, Arup Neogi and Jaehyung Ju

Mater. Horiz., 2026
DOI: 10.1039/D5MH02438B

Kirigami-enabled self-folding origami

Teunis van Manen, Shahram Janbaz, Mahya Ganjian and Amir A. Zadpoor

Materials Today, 2020, 32, 59
DOI: 10.1016/j.mattod.2019.08.001

Sub-10 nm writing: focused electron beam-induced deposition in perspective

W. F. van Dorp

Appl. Phys. A, 2014, 117, 1615
DOI: 10.1007/s00339-014-8588-8

Modeling the initial monolayer formation in thermally localized surface deposition

Bart de Braaf, Cor M. Rops and Cornelis Storm

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2021, 39
DOI: 10.1116/6.0001098

Dimension Control of Platinum Nanostructures by Atomic Layer Deposition: From Surface Chemical Reactions to Applications

Kim-Hue T. Dinh, Huong T. Thuy Ta, Ngoc Linh Nguyen, Viet Thong Le, Viet Huong Nguyen and Hao Van Bui

Chem. Mater., 2023, 35, 2248
DOI: 10.1021/acs.chemmater.2c03476

Selective dry etching of UV-nanoimprinted resin passivation masks for area selective atomic layer deposition of aluminum oxide

Chiaki Miyajima, Shunya Ito and Masaru Nakagawa

Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena, 2021, 39
DOI: 10.1116/6.0001250

Insight into the synthesis and adsorption mechanism of adsorbents for efficient phosphate removal: Exploration from synthesis to modification

Meng Du, Yueyan Zhang, Zeyi Wang, Mengran Lv, Aiqi Tang, Yang Yu, Xuan Qu, Zhiqiang Chen, Qinxue Wen and Ang Li

Chemical Engineering Journal, 2022, 442, 136147
DOI: 10.1016/j.cej.2022.136147

Area-selective atomic layer deposition of Ru on electron-beam-written Pt(C) patterns versus SiO2substratum

Marcel Junige, Markus Löffler, Marion Geidel, Matthias Albert, Johann W Bartha, Ehrenfried Zschech, Bernd Rellinghaus and Willem F van Dorp

Nanotechnology, 2017, 28, 395301
DOI: 10.1088/1361-6528/aa8844

Area‐Selective Atomic Layer Deposition on Functionalized Graphene Prepared by Reversible Laser Oxidation

Kamila K. Mentel, Aleksei V. Emelianov, Anish Philip, Andreas Johansson, Maarit Karppinen and Mika Pettersson

Adv Materials Inter, 2022, 9
DOI: 10.1002/admi.202201110

Control of ion energy during plasma enhanced atomic layer deposition: A new strategy for the modulation of TiN growth delay on SiO2

Samia Belahcen, Christophe Vallée, Ahmad Bsiesy, Ahmad Chaker, Moustapha Jaffal, Taguhi Yeghoyan and Marceline Bonvalot

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2021, 39
DOI: 10.1116/6.0000655

Residual Stress‐Driven Non‐Euclidean Morphing in Origami Structures

Zihe Liang, Sibo Chai, Qinyun Ding, Kai Xiao, Ke Liu, Jiayao Ma and Jaehyung Ju

Advanced Intelligent Systems, 2024, 6
DOI: 10.1002/aisy.202400246

Atomic layer deposition and selective etching of ruthenium for area-selective deposition: Temperature dependence and supercycle design

Martijn F. J. Vos, Sonali N. Chopra, John G. Ekerdt, Sumit Agarwal, Wilhelmus M. M. (Erwin) Kessels and Adriaan J. M. Mackus

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2021, 39
DOI: 10.1116/6.0000912

Selective growth of platinum nanolines by helium ion beam induced deposition and atomic layer deposition

Po-Shuan Yang, Zheng-da Huang, Kuei-Wen Huang and Miin-Jang Chen

Ultramicroscopy, 2020, 211, 112952
DOI: 10.1016/j.ultramic.2020.112952

Area-selective atomic layer deposition of noble metals: Polymerized fluorocarbon layers as effective growth inhibitors

Petro Deminskyi, Ali Haider, Hamit Eren, Talha M. Khan and Necmi Biyikli

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2021, 39
DOI: 10.1116/6.0000701

Atomic level deposition to extend Moore’s law and beyond

Rong Chen, Yi-Cheng Li, Jia-Ming Cai, Kun Cao and Han-Bo-Ram Lee

Int. J. Extrem. Manuf., 2020, 2, 022002
DOI: 10.1088/2631-7990/ab83e0

Influence of surface etching and oxidation on the morphological growth of Al2O3 by ALD

Mikhail Trought, Isobel Wentworth, Chathura de Alwis, Timothy R. Leftwich and Kathryn A. Perrine

Surface Science, 2019, 690, 121479
DOI: 10.1016/j.susc.2019.121479

Advances in area-selective atomic layer deposition: surface chemistry, challenges, and future perspectives

Hyosik Jo, Yunseok Kim, Seulwon Choi, Ilhan Yoo, Minji Han, Jung-El Ryu and Hwanyeol Park

Coordination Chemistry Reviews, 2026, 558, 217768
DOI: 10.1016/j.ccr.2026.217768

Supported Core/Shell Bimetallic Nanoparticles Synthesis by Atomic Layer Deposition

Matthieu J. Weber, Adriaan J. M. Mackus, Marcel A. Verheijen, Cees van der Marel and Wilhelmus M. M. Kessels

Chem. Mater., 2012, 24, 2973
DOI: 10.1021/cm301206e

Sub-nanometer dimensions control of core/shell nanoparticles prepared by atomic layer deposition

M J Weber, M A Verheijen, A A Bol and W M M Kessels

Nanotechnology, 2015, 26, 094002
DOI: 10.1088/0957-4484/26/9/094002

On the Principles of Tweaking Nanostructure Fabrication via Focused Electron Beam Induced Processing Combined with Catalytic Growth Processes

Martin Drost, Fan Tu, Florian Vollnhals, Imre Szenti, Janos Kiss and Hubertus Marbach

Small Methods, 2017, 1, 1700095
DOI: 10.1002/smtd.201700095

Review of magnetic nanostructures grown by focused electron beam induced deposition (FEBID)

J M De Teresa, A Fernández-Pacheco, R Córdoba, L Serrano-Ramón, S Sangiao and M R Ibarra

J. Phys. D: Appl. Phys., 2016, 49, 243003
DOI: 10.1088/0022-3727/49/24/243003

Phosphorus removal from water by the metal-organic frameworks (MOFs)-based adsorbents: A review for structure, mechanism, and current progress

Xiaojie Fang, Di Zhang, Zhenfeng Chang, Ruoyan Li and Shuangshuang Meng

Environmental Research, 2024, 243, 117816
DOI: 10.1016/j.envres.2023.117816

‘Cleanroom’ in SEM

G. Jeevanandam, V. van der Meijden, L.D. Birnie, P. Kruit and C.W. Hagen

Microelectronic Engineering, 2020, 224, 111239
DOI: 10.1016/j.mee.2020.111239

Direct-Write Atomic Layer Deposition of High-Quality Pt Nanostructures: Selective Growth Conditions and Seed Layer Requirements

A. J. M. Mackus, N. F. W. Thissen, J. J. L. Mulders, P. H. F. Trompenaars, M. A. Verheijen, A. A. Bol and W. M. M. Kessels

J. Phys. Chem. C, 2013, 117, 10788
DOI: 10.1021/jp402260j

Synthesis of single-walled carbon nanotubes from atomic-layer-deposited Co3O4 and Co3O4/Fe2O3 catalyst films

Nick F.W. Thissen, M.A. Verheijen, R.G. Houben, C. van der Marel, W.M.M. Kessels and A.A. Bol

Carbon, 2017, 121, 389
DOI: 10.1016/j.carbon.2017.06.001

Influence of Oxygen Exposure on the Nucleation of Platinum Atomic Layer Deposition: Consequences for Film Growth, Nanopatterning, and Nanoparticle Synthesis

Adriaan J. M. Mackus, Marcel A. Verheijen, Noémi Leick, Ageeth A. Bol and Wilhelmus M. M. Kessels

Chem. Mater., 2013, 25, 1905
DOI: 10.1021/cm400562u

Highly Reactive Atomic Hydrogen as an Alternative Reactant for Atomic Layer Deposition of Platinum Using MeCpPtMe3

Hao Van Bui, Fabio Grillo, Dieu Minh Nguyen, Manh Duc Dang, Antonius A. I. Aarnink, Rob A. M. Wolters, J. Ruud van Ommen and Alexey Y. Kovalgin

J. Phys. Chem. C, 2025, 129, 13822
DOI: 10.1021/acs.jpcc.5c03286

Area selective deposition for bottom-up atomic-scale manufacturing

Rong Chen, Eryan Gu, Kun Cao and Jingming Zhang

International Journal of Machine Tools and Manufacture, 2024, 199, 104173
DOI: 10.1016/j.ijmachtools.2024.104173

Vacuum ultraviolet photochemical selective area atomic layer deposition of Al2O3 dielectrics

P. R. Chalker, P. A. Marshall, K. Dawson, I. F. Brunell, C. J. Sutcliffe and R. J. Potter

AIP Advances, 2015, 5
DOI: 10.1063/1.4905887

In situconductance monitoring of Pt thin film growth by area-selective atomic layer deposition

Giorgia Di Prima, Roland Sachser, Peter Gruszka, Marc Hanefeld, Thomas Halbritter, Alexander Heckel and Michael Huth

Nano Futures, 2017, 1, 025005
DOI: 10.1088/2399-1984/aa8cbb

Area-Selective Molecular Layer Deposition of Polyimide on Cu through Cu-Catalyzed Formation of a Crystalline Interchain Polyimide

Chao Zhang, Marko Vehkamäki, Mika Pietikäinen, Markku Leskelä and Mikko Ritala

Chem. Mater., 2020, 32, 5073
DOI: 10.1021/acs.chemmater.0c00898

Integrating Structural Colors with Additive Manufacturing Using Atomic Layer Deposition

Benjamin A. Rorem, Tae H. Cho, Nazanin Farjam, Julia D. Lenef, Kira Barton, Neil P. Dasgupta and L. Jay Guo

ACS Appl. Mater. Interfaces, 2022, 14, 31099
DOI: 10.1021/acsami.2c05940

Inherently Selective Atomic Layer Deposition and Applications

Kun Cao, Jiaming Cai and Rong Chen

Chem. Mater., 2020, 32, 2195
DOI: 10.1021/acs.chemmater.9b04647

Area Selective Atomic Layer Deposition for the Use on Active Implants: An Overview of Available Process Technology

Nicolai Simon, Thomas Stieglitz and Volker Bucher

Adv Healthcare Materials, 2025, 14
DOI: 10.1002/adhm.202403149

Area‐selective atomic layer deposition on HOPG enabled by writable electron beam functionalization

Gordon Koerner, Quinton K. Wyatt, Brady Bateman, Camden Boyle, Matthias J. Young and Matthew R. Maschmann

Nano Select, 2022, 3, 1448
DOI: 10.1002/nano.202200091

Purity and resistivity improvements for electron-beam-induced deposition of Pt

J. J. L. Mulders

Appl. Phys. A, 2014, 117, 1697
DOI: 10.1007/s00339-014-8662-2

Area-Selective Atomic Layer Deposition of ZnO by Area Activation Using Electron Beam-Induced Deposition

Alfredo Mameli, Bora Karasulu, Marcel A. Verheijen, Beatriz Barcones, Bart Macco, Adriaan J. M. Mackus, Wilhelmus M. M. Erwin Kessels and Fred Roozeboom

Chem. Mater., 2019, 31, 1250
DOI: 10.1021/acs.chemmater.8b03165

Gold Complexes for Focused-Electron-Beam-Induced Deposition

W. F. van Dorp, X. Wu, J. J. L. Mulders, S. Harder, P. Rudolf and J. T. M. De Hosson

Langmuir, 2014, 30, 12097
DOI: 10.1021/la502618t

Computational Ab Initio Approaches for Area-Selective Atomic Layer Deposition: Methods, Status, and Perspectives

Fabian Pieck and Ralf Tonner-Zech

Chem. Mater., 2025, 37, 2979
DOI: 10.1021/acs.chemmater.4c03477

Direct writing on graphene ‘paper’ by manipulating electrons as ‘invisible ink’

Wei Zhang, Qiang Zhang, Meng-Qiang Zhao and Luise Theil Kuhn

Nanotechnology, 2013, 24, 275301
DOI: 10.1088/0957-4484/24/27/275301

Graphene devices with bottom-up contacts by area-selective atomic layer deposition

Nick F W Thissen, René H J Vervuurt, Adriaan J M Mackus, Johannes J L Mulders, Jan-Willem Weber, Wilhelmus M M Kessels and Ageeth A Bol

2D Mater., 2017, 4, 025046
DOI: 10.1088/2053-1583/aa636a

The role of electron-stimulated desorption in focused electron beam induced deposition

Willem F van Dorp, Thomas W Hansen, Jakob B Wagner and Jeff T M De Hosson

Beilstein J. Nanotechnol., 2013, 4, 474
DOI: 10.3762/bjnano.4.56

From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity

Adriaan J. M. Mackus, Marc J. M. Merkx and Wilhelmus M. M. Kessels

Chem. Mater., 2019, 31, 2
DOI: 10.1021/acs.chemmater.8b03454

Area-Selective Atomic Layer Deposition Patterned by Electrohydrodynamic Jet Printing for Additive Manufacturing of Functional Materials and Devices

Tae H. Cho, Nazanin Farjam, Christopher R. Allemang, Christopher P. Pannier, Eric Kazyak, Carli Huber, Mattison Rose, Orlando Trejo, Rebecca L. Peterson, Kira Barton and Neil P. Dasgupta

ACS Nano, 2020, 14, 17262
DOI: 10.1021/acsnano.0c07297

Area-selective atomic layer deposition of platinum using photosensitive polyimide

René H J Vervuurt, Akhil Sharma, Yuqing Jiao, Wilhelmus (Erwin) M M Kessels and Ageeth A Bol

Nanotechnology, 2016, 27, 405302
DOI: 10.1088/0957-4484/27/40/405302

Selective Growth of Titanium Nitride on HfO2 across Nanolines and Nanopillars

Sonali N. Chopra, Zizhuo Zhang, Chris Kaihlanen and John G. Ekerdt

Chem. Mater., 2016, 28, 4928
DOI: 10.1021/acs.chemmater.6b01036

Electron beam induced surface activation: a method for the lithographic fabrication of nanostructures via catalytic processes

Hubertus Marbach

Appl. Phys. A, 2014, 117, 987
DOI: 10.1007/s00339-014-8578-x

Fabrication of DNA-Templated Pt Nanostructures by Area-Selective Atomic Layer Deposition

Liwei Hui, Chen Chen, Min A. Kim and Haitao Liu

ACS Appl. Mater. Interfaces, 2022, 14, 16538
DOI: 10.1021/acsami.2c02244

Substrate-Dependent Area-Selective Atomic Layer Deposition of Noble Metals from Metal β-Diketonate Precursors

Chao Zhang, Eva Tois, Markku Leskelä and Mikko Ritala

Chem. Mater., 2022, 34, 8379
DOI: 10.1021/acs.chemmater.2c02084

Resist-free fabricated carbon nanotube field-effect transistors with high-quality atomic-layer-deposited platinum contacts

Adriaan J. M. Mackus, Nick F. W. Thissen, Johannes J. L. Mulders, Petrus H. F. Trompenaars, Zhihong Chen, Wilhelmus M. M. Kessels and Ageeth A. Bol

Applied Physics Letters, 2017, 110
DOI: 10.1063/1.4973359

Area-Selective Deposition: Fundamentals, Applications, and Future Outlook

Gregory N. Parsons and Robert D. Clark

Chem. Mater., 2020, 32, 4920
DOI: 10.1021/acs.chemmater.0c00722

Atomic Layer Deposition of Noble Metals and Their Oxides

Jani Hämäläinen, Mikko Ritala and Markku Leskelä

Chem. Mater., 2014, 26, 786
DOI: 10.1021/cm402221y

The rational design of a Au(I) precursor for focused electron beam induced deposition

Ali Marashdeh, Thiadrik Tiesma, Niels J C van Velzen, Sjoerd Harder, Remco W A Havenith, Jeff T M De Hosson and Willem F van Dorp

Beilstein J. Nanotechnol., 2017, 8, 2753
DOI: 10.3762/bjnano.8.274

Effect of O3 on Growth of Pt by Atomic Layer Deposition

Han-Bo-Ram Lee, Katie L. Pickrahn and Stacey F. Bent

J. Phys. Chem. C, 2014, 118, 12325
DOI: 10.1021/jp502596n

Plasma-assisted atomic layer deposition of conformal Pt films in high aspect ratio trenches

I. J. M. Erkens, M. A. Verheijen, H. C. M. Knoops, W. Keuning, F. Roozeboom and W. M. M. Kessels

The Journal of Chemical Physics, 2017, 146
DOI: 10.1063/1.4972120

Focused electron beam induced deposition meets materials science

M. Huth, F. Porrati and O.V. Dobrovolskiy

Microelectronic Engineering, 2018, 185-186, 9
DOI: 10.1016/j.mee.2017.10.012

Area-Selective Atomic Layer Deposition Using an Inductively Coupled Plasma Polymerized Fluorocarbon Layer: A Case Study for Metal Oxides

Ali Haider, Petro Deminskyi, Talha M. Khan, Hamit Eren and Necmi Biyikli

J. Phys. Chem. C, 2016, 120, 26393
DOI: 10.1021/acs.jpcc.6b09406

Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation

Alfredo Mameli, Yinghuan Kuang, Morteza Aghaee, Chaitanya K. Ande, Bora Karasulu, Mariadriana Creatore, Adriaan J. M. Mackus, Wilhelmus M. M. Kessels and Fred Roozeboom

Chem. Mater., 2017, 29, 921
DOI: 10.1021/acs.chemmater.6b04469

Graphene as plasma-compatible blocking layer material for area-selective atomic layer deposition: A feasibility study for III-nitrides

Petro Deminskyi, Ali Haider, Evgeniya Kovalska and Necmi Biyikli

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018, 36
DOI: 10.1116/1.5003421

Energy-enhanced atomic layer deposition for more process and precursor versatility

S.E. Potts and W.M.M. Kessels

Coordination Chemistry Reviews, 2013, 257, 3254
DOI: 10.1016/j.ccr.2013.06.015

Review Article: Catalysts design and synthesis via selective atomic layer deposition

Kun Cao, Jiaming Cai, Xiao Liu and Rong Chen

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2018, 36
DOI: 10.1116/1.5000587