Force-induced fluorescence response of functional two-photon micro-nanofabrication photosensitive materials based on dynamic C–N bonds

Abstract

Epoxy acrylate (EA) has excellent thermal performance, mechanical properties, and chemical stability, making it a typical representative of thermosetting resins. Dynamic C–N bonds were introduced through chemical click reactions between triazolinedione (TAD) and indole, resulting in EA polymers with different mass ratios. Among them, the 80 wt% EA-10 : 3 had the strongest tensile strength of 71.03 MPa with an elongation at break of 7%, while the 90 wt% EA-10 : 2.5 had a relatively excellent modulus and hardness of 5.21 GPa and 223 MPa by nanoindentation testing, respectively. In addition, the 90 wt% EA-10 : 3 polymer exhibited good two-photon polymerization printing performance with scanning speeds of 100 μm s−1–100 000 μm s−1 and laser powers of 5 mW–50 mW. Simultaneously, the sample block exhibited mechanical properties with a modulus and hardness of 5.12 GPa and 230 MPa under the laser power of 30 mW. In situ relaxation fluorescence spectroscopy was used to characterize the dynamic behavior of the C–N bonds in force reversible polymer networks. This work proposes a valuable strategy to enhance the functionality of EA polymers in various special performance material applications, while maintaining their strength and toughness.

Graphical abstract: Force-induced fluorescence response of functional two-photon micro-nanofabrication photosensitive materials based on dynamic C–N bonds

Supplementary files

Transparent peer review

To support increased transparency, we offer authors the option to publish the peer review history alongside their article.

View this article’s peer review history

Article information

Article type
Paper
Submitted
12 may. 2025
Accepted
01 jul. 2025
First published
04 jul. 2025

Polym. Chem., 2025, Advance Article

Force-induced fluorescence response of functional two-photon micro-nanofabrication photosensitive materials based on dynamic C–N bonds

Y. Gao, J. Hu, L. Wu, S. Zhang, J. Li and K. Du, Polym. Chem., 2025, Advance Article , DOI: 10.1039/D5PY00469A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements