Issue 14, 2025

Highly conductive Cu-deposited basalt fiber fabric for high-performance electromagnetic interference shielding and Joule heating

Abstract

Addressing the escalating demand for lightweight, highly conductive, thin, large-area, and mechanically flexible materials with high electromagnetic interference (EMI) shielding effectiveness, alongside superior electrical and mechanical properties crucial for advanced wireless electronics and next-generation telecommunications (6G), we introduce a novel Cu-deposited basalt fiber fabric (BFF) fabricated via electroless Cu deposition across varying temperatures (room temperature to 60 °C). This material exhibits exceptional EMI shielding performance, achieving 81.7 dB in the X-band (8.2–12.4 GHz) at a minimal thickness of approximately 7.69 μm. Furthermore, it demonstrates significantly high electrical conductivity, reaching a peak of 4.81 × 105 S m−1, coupled with a low density of 3.08 g cm−3, substantially lighter than bulk Cu (8.96 g cm−3). The Cu-deposited BFF also possesses excellent mechanical properties, with breaking forces of 665 N (weft) and 3343 N (warp) achieved at the optimized deposition temperature of 50 °C, and superior Joule heating efficiency, reaching temperatures up to 136 °C at an applied voltage of 1.0 V. Integrating lightweight, high strength, thermal stability (up to 950 °C), and electrical conductivity, the Cu-deposited BFF presents itself as a sustainable and high-performance EMI shielding material with significant potential for scalable industrial applications.

Graphical abstract: Highly conductive Cu-deposited basalt fiber fabric for high-performance electromagnetic interference shielding and Joule heating

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Article information

Article type
Research Article
Submitted
14 Feb 2025
Accepted
02 Jun 2025
First published
06 Jun 2025

Mater. Chem. Front., 2025,9, 2260-2275

Highly conductive Cu-deposited basalt fiber fabric for high-performance electromagnetic interference shielding and Joule heating

A. Parkash, A. Kadier and P. Ma, Mater. Chem. Front., 2025, 9, 2260 DOI: 10.1039/D5QM00141B

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