Issue 1, 2021

Advanced technologies for the fabrication of MOF thin films

Abstract

Metal–organic framework (MOF) thin films represent a milestone in the development of future technological breakthroughs. The processability of MOFs as films on surfaces together with their major features (i.e. tunable porosity, large internal surface area, and high crystallinity) is broadening their range of applications to areas such as gas sensing, microelectronics, photovoltaics, and membrane-based separation technologies. Despite the recent attention that MOF thin films have received, many challenges still need to be addressed for their manufacturing and integrability, especially when an industrial scale-up perspective is envisioned. In this brief review, we introduce several appealing approaches that have been developed in the last few years. First, a summary of liquid phase strategies that comprise microfluidic methods and supersaturation-driven crystallization processes is described. Then, gas phase approaches based on atomic layer deposition (ALD) are also presented.

Graphical abstract: Advanced technologies for the fabrication of MOF thin films

Article information

Article type
Minireview
Submitted
02 jun. 2020
Accepted
10 ago. 2020
First published
28 sep. 2020
This article is Open Access
Creative Commons BY-NC license

Mater. Horiz., 2021,8, 168-178

Advanced technologies for the fabrication of MOF thin films

C. Crivello, S. Sevim, O. Graniel, C. Franco, S. Pané, J. Puigmartí-Luis and D. Muñoz-Rojas, Mater. Horiz., 2021, 8, 168 DOI: 10.1039/D0MH00898B

This article is licensed under a Creative Commons Attribution-NonCommercial 3.0 Unported Licence. You can use material from this article in other publications, without requesting further permission from the RSC, provided that the correct acknowledgement is given and it is not used for commercial purposes.

To request permission to reproduce material from this article in a commercial publication, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party commercial publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements