Issue 17, 2015

Three-step sequential solution deposition of PbI2-free CH3NH3PbI3 perovskite

Abstract

We demonstrate a three-step sequential solution process to prepare PbI2-free CH3NH3PbI3 perovskite films. In this three-step method, a thermally unstable stoichiometric PbI2·CH3NH3Cl precursor film is first deposited on the mesoporous TiO2 substrate, followed by thermal decomposition to form PbI2, which is finally converted into CH3NH3PbI3 by dipping in a regular isopropanol solution of CH3NH3I at room temperature. In comparison to the two-step approach using similar processing conditions, the three-step method enables the formation of the PbI2 film through the thermal decomposition of the PbI2·CH3NH3Cl precursor film. This facilitates a rapid conversion of PbI2 to CH3NH3PbI3 without any traceable residue PbI2 in the final conversion step, leading to an improved device performance.

Graphical abstract: Three-step sequential solution deposition of PbI2-free CH3NH3PbI3 perovskite

Article information

Article type
Communication
Submitted
09 oct. 2014
Accepted
25 nov. 2014
First published
26 nov. 2014

J. Mater. Chem. A, 2015,3, 9086-9091

Author version available

Three-step sequential solution deposition of PbI2-free CH3NH3PbI3 perovskite

Y. Zhao and K. Zhu, J. Mater. Chem. A, 2015, 3, 9086 DOI: 10.1039/C4TA05384B

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