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Chapter 5

Basic Chemistry of CVD and ALD Precursors

In chemical vapor deposition (CVD) processes thermal decomposition of a precursor is the key step that produces a thin-film deposit, and ideally the ligands associated with the precursor are cleanly lost into the gas phase. However, there are problems as the ligands may fragment and lead to impuriti...
Print publication date: 22 Dec 2008
Copyright year: 2009
Print ISBN: 978-0-85404-465-8
PDF eISBN: 978-1-84755-879-4