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Chapter 4

Atomic Layer Deposition

Atomic layer deposition (ALD) is a special variant of chemical vapour deposition (CVD) technology used to grow high-quality thin films through alternate self-limiting surface reactions (Figure 4.1). ALD has gained considerable interest in recent years as a thin film deposition method to overcome man...

Publication details


Print publication date
22 Dec 2008
Copyright year
2009
Print ISBN
978-0-85404-465-8
PDF eISBN
978-1-84755-879-4