Improved performance of organic single-crystal thin-film transistors via contact doping with a high electron-affinity dopant

Abstract

Organic single-crystal devices are regarded as the pinnacle of organic electronics in terms of performance, yet they are significantly hindered by the high Schottky barriers at metal-semiconductor contacts. Contact doping represents an effective strategy to mitigate Schottky barriers and boost device performance, and its success hinges on the use of a dopant with a high electron affinity (EA). Here, we introduce a potent p-type molecular dopant, 2-(7-dicyanomethylene-1,3,4,5,6,8,9,10-octafluoro-7H-pyrene-2-ylidene)-malononitrile (NDP-9), featuring multiple CN electron-withdrawing groups. This design endows NDP-9 with a notably higher EA than previously reported contact dopants for organic thin-film transistors (OTFTs). By incorporating the high-EA NDP-9 as an interfacial interlayer, the Schottky barrier height (ΦSB) is reduced from 0.25 eV to 0.05 eV, while simultaneously filling interfacial trap states. Consequently, OTFTs based on organic single-crystalline films exhibit a high mobility of 13.08 cm2 V−1 s−1, a low subthreshold swing (SS) of 187 mV dec−1, and enhanced long-term bias stress stability. Moreover, this straightforward method facilitates the fabrication of large-area device arrays, achieving an average mobility of up to 12.89 cm2 V−1 s−1 with high uniformity (relative variance of 5.07%). This study underscores the critical role of high-EA dopants in optimizing the electrical performance of OTFTs, offering a universal pathway for advancing high-performance organic electronics.

Graphical abstract: Improved performance of organic single-crystal thin-film transistors via contact doping with a high electron-affinity dopant

Supplementary files

Article information

Article type
Paper
Submitted
08 Nov 2025
Accepted
13 Jan 2026
First published
13 Jan 2026

J. Mater. Chem. C, 2026, Advance Article

Improved performance of organic single-crystal thin-film transistors via contact doping with a high electron-affinity dopant

X. Shi, W. Deng, S. He, X. Ren, H. Jiang, Y. Luo, B. Zhao, X. Zhang and J. Jie, J. Mater. Chem. C, 2026, Advance Article , DOI: 10.1039/D5TC03977K

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