The effect of defects on the formation of inversion domain boundaries in AlScN and their structural/electronic property improvement

Abstract

Wurtzite AlScN, a promising material for high-power electronic and piezoelectric applications, faces performance challenges due to defects such as inversion domain boundaries (IDBs) and elemental contaminations at interfaces. This study explores the mechanisms underlying the IDB formation of AlScN, using density functional theory (DFT) and density functional perturbation theory (DFPT). The results show that IDBs are influenced by Sc incorporation, oxygen contamination, and applied strains, which impact abnormal crystallinity, piezoelectricity and electronic performance. In particular, an increase in the ratio of Sc to Al at grain boundaries would promote abnormally oriented grain (AOG) boundaries as well as IDBs. Strategies such as controlling oxygen contamination and applying strain are identified to mitigate these issues. In addition, AlScN generally receives compressive/tensile strains from the other wurtzite nitrides acting as substrates (i.e. AlN, AlGaN, GaN, InAlN, InGaN and InN) that have different unit cell areas compared to AlScN. The interfacial compressive strain inevitably reduces the piezoelectricity of AlScN. However, applying surface tensile strain to the substrates would increase the piezoelectric properties of AlScN as well as suppress IDBs. These findings provide insights into improving AlScN-based materials for advanced applications in high-power electronic devices and piezoelectric technology.

Graphical abstract: The effect of defects on the formation of inversion domain boundaries in AlScN and their structural/electronic property improvement

Supplementary files

Article information

Article type
Paper
Submitted
21 Jul 2025
Accepted
15 Oct 2025
First published
15 Oct 2025

J. Mater. Chem. C, 2026, Advance Article

The effect of defects on the formation of inversion domain boundaries in AlScN and their structural/electronic property improvement

T. Hwang, A. C. Kummel and K. Cho, J. Mater. Chem. C, 2026, Advance Article , DOI: 10.1039/D5TC02770E

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements