An all-photonic isolator using atomically thin (2D) bismuth telluride (Bi2Te3)

Abstract

Here, we demonstrate two-dimensional (2D) Bi2Te3 with broadband Kerr nonlinear optical response, which can be used for nonreciprocal light propagation in passive photonic isolators. The self-induced diffraction patterns generated at various wavelengths (650 nm, 532 nm, and 405 nm) in the far field are investigated to calculate the nonlinear refractive index (n2) and third-order nonlinear susceptibility χ(3)total of the synthesized 2D Bi2Te3 using the SSPM (spatial self-phase modulation) spectroscopy method. 2D Bi2Te3 exhibits a significant nonlinear refractive index on the order of ≈10−4 cm2 W−1, which is higher than that of graphene. The laser-induced hole-coherence effect accounts for the significant magnitude of the third-order nonlinear susceptibility χ(3)monolayer (on the order of 10−7 e.s.u.). Surface engineering is applied to realize a fast-response photonic system. Bader charge analysis (ab initio simulations) was performed to probe the interaction between 2D Bi2Te3 and different solvent molecules. 2D hBN exhibits reversible saturation, reducing the intensity of the propagating beam. Leveraging the enhanced Kerr nonlinearity of 2D Bi2Te3, a nonlinear photonic isolator (2D-Bi2Te3–2D-hBN heterostructure) that disrupts time-reversal symmetry has been successfully demonstrated, enabling unidirectional light propagation. This demonstration of the photonic isolator shows Bi2Te3 as a novel 2D material, expanding its potential applications across multiple photonic devices, including detectors, modulators, and switches.

Graphical abstract: An all-photonic isolator using atomically thin (2D) bismuth telluride (Bi2Te3)

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Article information

Article type
Paper
Submitted
26 Jan 2026
Accepted
20 Mar 2026
First published
09 Apr 2026

Nanoscale, 2026, Advance Article

An all-photonic isolator using atomically thin (2D) bismuth telluride (Bi2Te3)

S. Goswami, B. Ipaves, J. G. Quispe, C. Campos de Oliveira, S. Slathia, M. B. Abhijith, V. Pal, C. J. S. de Matos, S. K. Ray, D. S. Galvao, P. A. S. Autreto and C. S. Tiwary, Nanoscale, 2026, Advance Article , DOI: 10.1039/D6NR00354K

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