Origins of Electrostriction of MoS2 and HfS2 in 2 and 3 dimensional 1T and 2H structures

Abstract

Understanding and controlling electromechanical responses of bulk and low dimensional materials are of fundamental and technological importance. Electrostriction and piezoelectricity are two key phenomena in which mechanical strain is generated in response to electric fields, forming the basis for a wide range of electromechanical devices. Piezoelectric response is linear and symmetry-restricted, while electrostriction is universal, second order response that occurs in all dielectrics, including centrosymmetric systems. In this work, we present a theoretical analysis of electrostrictive responses of two and three dimensional 1T and 2H polymorphs of TMS2 (TM = Mo and Hf) with first-principles calculations of the changes in dielectric susceptibility, χ, arising in response to applied stress. We uncover the effects of chemical composition, polymorph (structure) and dimensionality (number of layers (N) in their two-dimensional forms) on the electronic (Melec) and phononic (Mphononic) contributions to the electrostrictive response of TMS2. We find that (a) composition has a remarkable impact on the electronic part of electrostriction: Melec is positive for MoS2 and negative for HfS2, (b) electrostrictive response depends strongly on structure: while it is dominated by electronic contribution in the 2H form, it is largely phononic in the 1T form. (c) Number of layers (N) further influences the response: the phononic contribution (Mphononic) is nearly unaffected by the reduction in N, whereas the electronic contribution (Melec) reduces notably, consistent with widening of band gap responsible for weakening of electronic response. Analyzing the contributions of IR-active modes in terms of their mode effective charges (Z*λ) and oscillator strengths (ελ), we show that strong coupling of the soft modes in 1T-structure with IR-field play a pivotal role in enhancing the phonon contribution to the dielectric and electrostrictive responses. Our finding that the in-plane electric field induces tensile and compressive electrostrictive strains respectively in monolayered MoS2 and HfS2 has important consequences to their electronic devices and heterostructures, possibly with a twist.

Supplementary files

Article information

Article type
Paper
Submitted
23 Apr 2025
Accepted
15 Dec 2025
First published
18 Dec 2025

Nanoscale, 2026, Accepted Manuscript

Origins of Electrostriction of MoS2 and HfS2 in 2 and 3 dimensional 1T and 2H structures

K. Debnath, A. K. Sood and U. V. Waghmare, Nanoscale, 2026, Accepted Manuscript , DOI: 10.1039/D5NR01645B

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