Polypyridinophane Thin Films via CVD process for Polymeric Dielectric Layer on Oxide TFT with Ultrahigh Dielectric Constant

Abstract

High-k polymer gate dielectrics are desirable for oxide thin-film transistors but limited by low capacitance and interfacial instability. Here, pyridinophane-based polymers with main-chain heteroatoms are processed via a Gorham-type chemical vapor polymerization to form ultrathin, pinhole-free dielectrics with enhanced dielectric properties and reliable oxide transistor performance.

Supplementary files

Article information

Article type
Communication
Submitted
27 Feb 2026
Accepted
18 May 2026
First published
19 May 2026

Nanoscale Horiz., 2026, Accepted Manuscript

Polypyridinophane Thin Films via CVD process for Polymeric Dielectric Layer on Oxide TFT with Ultrahigh Dielectric Constant

W. K. Park, J. W. Park, G. Lee, S. Jang, H. Kim and K. J. Lee, Nanoscale Horiz., 2026, Accepted Manuscript , DOI: 10.1039/D6NH00093B

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