A thermally engineered NbOx memristor with CdTe2 interlayers for high-accuracy ECG arrhythmia detection

Abstract

Niobium oxide (NbOx)-based threshold switching memristors (TSMs) demonstrate significant promise for hardware implementation of neuromorphic computing, but their threshold stability's susceptibility to external environmental variations remains unclear. This work elucidates the switching mechanism in an NbOx-TSM incorporating a low-thermal-conductivity CdTe2 interlayer, which operates via the Poole–Frenkel (PF) emission model. Our investigation reveals that a double interlayer structure yields the highest effective thermal resistance, thereby most effectively reducing the threshold voltage. By implementing this structure, we enhanced the switching stability by 30.9%. Furthermore, increasing the thickness of the double-sided interlayers from 3 nm to 9 nm improved the stability by an additional 24.7% while simultaneously lowering the threshold voltage. The impact of the interlayer thickness on oscillatory behavior was systematically analyzed within a leaky integrate-and-fire (LIF) neuron circuit, where the observed frequency saturation phenomenon provides critical guidance for thermal engineering design. Capitalizing on these findings, we developed a multimodal, integrated memristor-based system for electrocardiogram (ECG) arrhythmia detection that leverages device thickness and temperature characteristics to achieve a classification accuracy rate of 90.0%. This work underscores the significant value of such physically interpretable devices for the hardware realization of neuromorphic computing.

Graphical abstract: A thermally engineered NbOx memristor with CdTe2 interlayers for high-accuracy ECG arrhythmia detection

Supplementary files

Article information

Article type
Communication
Submitted
14 Sep 2025
Accepted
23 Jan 2026
First published
24 Jan 2026

Mater. Horiz., 2026, Advance Article

A thermally engineered NbOx memristor with CdTe2 interlayers for high-accuracy ECG arrhythmia detection

Y. Zhu, C. Xie, Z. Ye, T. Jiang, Y. Zhang, K. Wang, X. Wu, H. Tang, J. Zhang, Y. Hu, Y. Zhu, Z. Feng, Z. Xu, L. Xu, W. Lu, Z. Wu and Y. Dai, Mater. Horiz., 2026, Advance Article , DOI: 10.1039/D5MH01754H

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