Unveiling the Synergy of Delocalized O 2p Holes and Localized Ce 4f States for Enhanced NH3-SCR Activity on WO3/La-CeO2 Catalyst

Abstract

NH3-selective catalytic reduction (NH3-SCR) is a key technology for efficient NOx removal, yet its performance remains fundamentally limited by sluggish NH3 activation and redox kinetics over conventional catalysts. Although heterovalent doping (e.g., La) is widely employed to enhance the NH3-SCR activity of ceria-based catalysts, the underlying electronic mechanism remains elusive. Herein, spin-polarized density functional theory calculations corrected by on-site Coulomb interactions reveal that La doping induces delocalized O 2p holes on WO3/La-CeO2(111), which serve as the primary electron reservoir during the NH3-SCR reaction. These delocalized O 2p holes can work synergistically with the localized Ce 4f states to accommodate the redistributed charges, lowering the activation barrier for NH3 dissociation. This synergistic effect also affects the N-N coupling stage, where dynamic electron transfer between Ce 4f states and O 2p holes stabilizes the migration of NH2 species. As the result, such La-induced O 2p holes provide a significant thermodynamic driving force for the overall reaction. Our work establishes the synergy between delocalized O 2p holes and localized Ce 4f states as the origin of La-promoted NH3-SCR activity, providing a rational strategy for designing high-performance catalysts via electronic structure engineering. These insights highlight that heterovalent doping can effectively tune the redox properties of lattice oxygen in ceria-based catalysts and may provide theoretical guidance for the development of efficient vanadium-free NH3-SCR systems.

Supplementary files

Article information

Article type
Paper
Submitted
01 May 2026
Accepted
14 Jun 2026
First published
15 Jun 2026

Phys. Chem. Chem. Phys., 2026, Accepted Manuscript

Unveiling the Synergy of Delocalized O 2p Holes and Localized Ce 4f States for Enhanced NH3-SCR Activity on WO3/La-CeO2 Catalyst

Z. Guo, Z. Wang and X. Gong, Phys. Chem. Chem. Phys., 2026, Accepted Manuscript , DOI: 10.1039/D6CP01609J

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