Monolayer Sc2NF2 and Sc2NO2 electrodes for bilayer MoS2: Achieving symmetric and excellent performances

Abstract

Achieving n- and p-type symmetric and excellent two-dimensional (2D) Schottky barrier field-effect transistors (SBFETs) remains a significant challenge, particularly when employing a homogeneous channel. The electrode contact properties for bilayer (BL) MoS2 and the corresponding device performances are investigated using ab initio calculations. Stable van der Waals (vdW)-type heterojunctions are formed between BL MoS2 and monolayer (ML) Sc2NX2 (X = F or O) in primitive cells, resulting in Ohmic contacts at both vertical and lateral interfaces. Consequently, superior n- and p-type device performances are achieved for the 10-nm-gate BL MoS2 SBFETs with ML Sc2NF2 and Sc2NO2 electrodes under Vdd = 0.5 V for high-performance applications. These results surpass the International Roadmap for Devices and Systems targets specified in the ‘5am eq’ note for 12 nm gate devices operating at Vdd = 0.6 V. The outstanding and symmetric performance indicates that BL MoS2 SBFETs with ML Sc2NF2 and Sc2NO2 electrodes are promising post-Si candidates for high-performance logic circuits.

Supplementary files

Transparent peer review

To support increased transparency, we offer authors the option to publish the peer review history alongside their article.

View this article’s peer review history

Article information

Article type
Paper
Accepted
02 Jan 2026
First published
05 Jan 2026

Phys. Chem. Chem. Phys., 2026, Accepted Manuscript

Monolayer Sc2NF2 and Sc2NO2 electrodes for bilayer MoS2: Achieving symmetric and excellent performances

X. Hu, H. Li, P. Liu, F. Liu and J. Lu, Phys. Chem. Chem. Phys., 2026, Accepted Manuscript , DOI: 10.1039/D5CP04839G

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements