Issue 12, 2024

Substrate suppression of oxidation process in pnictogen monolayers

Abstract

2D materials present an interesting platform for device designs. However, oxidation can drastically change the system's properties, which need to be accounted for. Through ab initio calculations, we investigated freestanding and SiC-supported As, Sb, and Bi mono-elemental layers. The oxidation process occurs through an O2 spin-state transition, accounted for within the Landau–Zener transition. Additionally, we have investigated the oxidation barriers and the role of spin–orbit coupling. Our calculations pointed out that the presence of SiC substrate reduces the oxidation time scale compared to a freestanding monolayer. We have extracted the energy barrier transition, compatible with our spin-transition analysis. Besides, spin–orbit coupling is relevant to the oxidation mechanisms and alters time scales. The energy barriers decrease as the pnictogen changes from As to Sb to Bi for the freestanding systems, while for SiC-supported, they increase across the pnictogen family. Our computed energy barriers confirm the enhanced robustness against oxidation for the SiC-supported systems.

Graphical abstract: Substrate suppression of oxidation process in pnictogen monolayers

Article information

Article type
Paper
Submitted
18 Aug 2023
Accepted
03 Oct 2023
First published
04 Oct 2023

Phys. Chem. Chem. Phys., 2024,26, 9149-9154

Substrate suppression of oxidation process in pnictogen monolayers

R. L. H. Freire, F. C. de Lima and A. Fazzio, Phys. Chem. Chem. Phys., 2024, 26, 9149 DOI: 10.1039/D3CP03976E

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