Issue 3, 2019

Optical limiting properties of a few-layer MoS2/PMMA composite under excitation of ultrafast laser pulses

Abstract

MoS2/PMMA composite bulks have been successfully fabricated by homogeneously incorporating 2D layered MoS2 nanosheets into solid-state PMMA. The ultrafast nonlinear optical (NLO) properties of these MoS2/PMMA composite bulks excited by 800 nm ultrafast laser sources in the picosecond (ps) or femtosecond (fs) domains were investigated systematically for the first time. The dependence of optical-limiting performance with respect to the MoS2 concentration in the samples and the excitation pulse duration was studied in detail. It was found that the optical-limiting response increases with the concentration of MoS2 nanosheets in the PMMA matrix, and it decreases with the excitation pulse duration, respectively. The optical-limiting response under 100 fs excitation was much stronger than that under the 10 ps excitation pulse. Upon excitation by 100 fs laser pulses, the MoS2/PMMA composite exhibits an optical limiting starting threshold of 21.5 mJ cm−2, an optical limiting threshold of 315.1 mJ cm−2, and a limiting differential transmittance of 1.6%, respectively, and these values, to the best of our knowledge, are lower than those of other bulk nanomaterials, such as Fe2O3, C60, or Se doped silica xerogel, reported previously with a similar transmittance level (85%). These results have opened the door for highly efficient 2D-dichalcogenides/PMMA composite based optical limiters for ultrafast laser pulses and have great practical significance for the manufacture of high-quality solid-state optical limiters with low optical loss, high reliability and low cost.

Graphical abstract: Optical limiting properties of a few-layer MoS2/PMMA composite under excitation of ultrafast laser pulses

Article information

Article type
Paper
Submitted
22 Aug 2018
Accepted
15 Oct 2018
First published
17 Oct 2018

J. Mater. Chem. C, 2019,7, 495-502

Optical limiting properties of a few-layer MoS2/PMMA composite under excitation of ultrafast laser pulses

G. Liang, L. Tao, Y. H. Tsang, L. Zeng, X. Liu, J. Li, J. Qu and Q. Wen, J. Mater. Chem. C, 2019, 7, 495 DOI: 10.1039/C8TC04200D

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