Closing the loop in next-generation sensing through shadow sphere lithography, plasmonics, and artificial intelligence

Abstract

The rapid deployment of intelligent energy, health-care and manufacturing platforms is outpacing the capabilities of conventional transducers, demanding sub-percent accuracy, millisecond responses, long-term stabilities and wafer-scale integration. Plasmonic micro- and nano-optical sensors can, in principle, satisfy these metrics, but only if three historically separate research threads converge: (i) physics-guided nanostructure design that realises high-Q hybrid resonances; (ii) fabrication routes that translate these blueprints into low-cost, large-area devices; and (iii) data-centric signal processing and prediction that extracts reliable information from inherently weak, drift-prone optical read-outs. This review (mainly covering the years 2019–2024) provides the first end-to-end account of that convergence. We highlight shadow-sphere lithography (SSL) as a scalable, sub-50 nm patterning strategy; map the resulting structural library onto its plasmonic, lattice and bound-state resonances; and show how physics-aware artificial-intelligence (AI) pipelines denoise spectra, compensate batch variability, enhance the prediction, and even invert the design problem. We close by outlining a closed-loop roadmap—linking SSL, plasmonics, and AI analytics—that targets high refractive-index resolutions within millimetre footprints, while identifying open challenges in wafer-scale 3D patterning inverse design and automated self-assembly, to in-line quality grading, to adaptive signal interpretation.

Graphical abstract: Closing the loop in next-generation sensing through shadow sphere lithography, plasmonics, and artificial intelligence

Article information

Article type
Review Article
Submitted
05 Jul 2025
First published
23 Sep 2025

Chem. Soc. Rev., 2025, Advance Article

Closing the loop in next-generation sensing through shadow sphere lithography, plasmonics, and artificial intelligence

M. Cheng, X. Chen, J. Zhang, X. Ye and B. Ai, Chem. Soc. Rev., 2025, Advance Article , DOI: 10.1039/D5CS00345H

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