Issue 11, 2011

Ultrasensitive protein detection using lithographically defined Si multi-nanowire field effect transistors

Abstract

Low-doped silicon multi-nanowire field effect transistors with high ON/OFF ratio over 107 and a low subthreshold swing of 60–120 mV dec−1 are fabricated using lithographic semiconductor processes. The use of multi-nanowires instead of a single nanowire as sensing elements has shown improved device uniformity and stability in buffer solutions. The device stability is further improved with surface silanization and biasing with a solution gate rather than a backgate. pH sensing with a linear response over a range of 2–9 is achieved using these devices. Selective detection of bovine serum albumin at concentrations as low as 0.1 femtomolar is demonstrated.

Graphical abstract: Ultrasensitive protein detection using lithographically defined Si multi-nanowire field effect transistors

Supplementary files

Article information

Article type
Paper
Submitted
16 Nov 2010
Accepted
18 Mar 2011
First published
19 Apr 2011

Lab Chip, 2011,11, 1952-1961

Ultrasensitive protein detection using lithographically defined Si multi-nanowire field effect transistors

R. Tian, S. Regonda, J. Gao, Y. Liu and W. Hu, Lab Chip, 2011, 11, 1952 DOI: 10.1039/C0LC00605J

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