Additive nanoscale embedding of functional nanoparticles on silicon surface

Massimiliano Cavallini; Felice C. Simeone; Francesco Borgatti; Cristiano Albonetti; Vittorio Morandi; Claudio Sangregorio; Claudia Innocenti; Francesco Pineider; Emilia Annese; Giancarlo Panaccione; Luca Pasquali

doi:10.1039/C0NR00315H

Additive nanoscale embedding of functional nanoparticles on silicon surface†

Massimiliano Cavallini,*^a Felice C. Simeone,^a Francesco Borgatti,^a Cristiano Albonetti,^a Vittorio Morandi,^b Claudio Sangregorio,^cd Claudia Innocenti,^d Francesco Pineider,^d Emilia Annese,^e Giancarlo Panaccione^e and Luca Pasquali^f

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* Corresponding authors

^a CNR-ISMN, Via P. Gobetti 101, Bologna, Italy
E-mail: m.cavallini@bo.ismn.cnr.it

^b CNR-IMM Bologna, Via P. Gobetti 101, Bologna, Italy

^c CNR-ISTM Milano, Via C. Golgi 19, Milano, Italy

^d INSTM and Dep. of Chemistry “ U. Schiff” Università di Firenze, Via della Lastruccia 3–13, Sesto Fiorentino (FI), Italy

^e CNR-INFM-TASC S.S. 14-Km 163.5, AREA Science Park, Basovizza (TS), Italy

^f Dep. of Materials and Environmental Engineering, University of Modena and Reggio Emilia, Via Vignolese 905, Modena, Italy

Abstract

We present a novel additive process, which allows the spatially controlled integration of nanoparticles (NPs) inside silicon surfaces. The NPs are placed between a conductive stamp and a silicon surface; by applying a bias voltage a SiO₂ layer grows underneath the stamp protrusions, thus embedding the particles. We report the successful nanoembedding of CoFe₂O₄ nanoparticles patterned in lines, grids and logic structures.

Nanoscale

Additive nanoscale embedding of functional nanoparticles on silicon surface†

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Additive nanoscale embedding of functional nanoparticles on silicon surface

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