Issue 35, 2023

A novel broken-gap chemical-bonded SiC/Ti2CO2 heterojunction with band to band tunneling: first-principles investigation

Abstract

A broken-gap heterojunction is a bright approach for designing tunneling field-effect transistors (TFETs) due to its distinct quantum tunneling mechanisms. In this study, we investigate the electronic structure and transport characteristics of a SiC/Ti2CO2 heterojunction, as well as the impacts of electric field and strain on the electronic properties via density functional theory. We determine that the interfacial atoms of the heterojunction are covalently bonded, forming a type-III heterojunction with a broken-gap. There exists band-to-band tunneling (BTBT) from the valence band (VB) of SiC to the conduction band (CB) of Ti2CO2. The creation of the heterojunction also enhances the carrier mobility arising from the large elastic modulus and the decrease of deformation potential. The current–voltage (I–V) characteristics of the device demonstrate a pronounced negative differential resistance (NDR) effect, along with a current that is about ten times greater than that of the vdW type-III heterojunction. Moreover, the tunneling window of SiC/Ti2CO2 is only slightly altered when subjected to an external electric field and vertical strain, demonstrating the remarkable stability of its type-III band alignments. Our results indicate that the SiC/Ti2CO2 heterojunction is useful to construct high-performance TFETs, and also introduces new ideas to design TFETs by using type-III covalent-bond heterojunctions.

Graphical abstract: A novel broken-gap chemical-bonded SiC/Ti2CO2 heterojunction with band to band tunneling: first-principles investigation

Supplementary files

Article information

Article type
Paper
Submitted
12 Jul 2023
Accepted
17 Aug 2023
First published
19 Aug 2023

Phys. Chem. Chem. Phys., 2023,25, 23954-23962

A novel broken-gap chemical-bonded SiC/Ti2CO2 heterojunction with band to band tunneling: first-principles investigation

Z. Dai, W. Sheng, X. Zhou, J. Zhan and Y. Xu, Phys. Chem. Chem. Phys., 2023, 25, 23954 DOI: 10.1039/D3CP03273F

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