Issue 35, 2019

Study of dispersion mechanisms of modified SiC powder: electrostatic repulsion and steric hindrance mechanism

Abstract

Surface modification technology was used to increase the dispersion of SiC powder. A slurry with high stability was fabricated using modified SiC powder with high dispersibility. The relative settlement height (RSH) of the slurry was maintained at 72.5% after 30 hours, indicating the high stability of SiC powder co-modified with polyvinylpyrrolidone (PVP) and tetramethyl ammonium hydroxide (TMAH) in water medium. Meanwhile, the minimum viscosity of 0.322 Pa s was obtained at 45 vol% solid content, and the maximum solid content of the slurry was 64.6 vol%. In addition, the maximum zeta potential of modified SiC powder was −58.5 mV, indicating strong electrostatic repulsion among particles. Therefore, the modified SiC powder shows high dispersion. More important is that the effect of the dispersion mechanism on the performance of modified SiC powder was investigated in depth. TMAH, as one of the excellent dispersants, can increase the electrostatic repulsion among particles significantly, facilitating the preparation of the slurry with low viscosity and high solid content. However, PVP, as one of the neutral polymers with hydrophilicity, plays an important role in maintaining the stability of the slurry.

Graphical abstract: Study of dispersion mechanisms of modified SiC powder: electrostatic repulsion and steric hindrance mechanism

Supplementary files

Article information

Article type
Paper
Submitted
27 Apr 2019
Accepted
06 Aug 2019
First published
06 Aug 2019

New J. Chem., 2019,43, 14036-14044

Study of dispersion mechanisms of modified SiC powder: electrostatic repulsion and steric hindrance mechanism

Y. Wei and Y. Liu, New J. Chem., 2019, 43, 14036 DOI: 10.1039/C9NJ02131K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements