Chitosan-modified biochar enhanced PFAS degradation in UV/sulfite: impact of environmental conditions and applicability across different PFAS

Abstract

The persistence of per- and polyfluoroalkyl substances (PFAS) in aquatic environments poses significant environmental and health risks, necessitating the development of effective and sustainable remediation strategies. This study evaluated the combined use of chitosan-modified biochar (Chi-BC) and ultraviolet advanced reduction processes (UV-ARP) for PFAS degradation, focusing on environmental influences and varying PFAS chemistries. Chi-BC effectively adsorbed and concentrated PFAS onto its surface, enhancing localized radical activity and enabling efficient defluorination. The Chi-BC/UV-ARP system achieved high degradation and defluorination rates, notably with long-chain PFAS, where adsorption facilitated radical access to C–F bonds. Environmental factors, including ionic strength, nitrate, and natural organic matter (NOM), impacted system efficiency by altering radical availability and PFAS interactions. Interestingly, nitrate enhanced PFAS adsorption onto Chi-BC, indirectly promoting defluorination, while NOM showed mixed effects depending on concentration. Overall, this work presented Chi-BC/UV-ARP as an energy-efficient PFAS treatment strategy, where Chi-BC's adsorption characteristics enabled the use of compact reactors and lower energy inputs, advancing practical applications for diverse water chemistries.

Graphical abstract: Chitosan-modified biochar enhanced PFAS degradation in UV/sulfite: impact of environmental conditions and applicability across different PFAS

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Article information

Article type
Paper
Submitted
15 Jul 2025
Accepted
26 Oct 2025
First published
05 Nov 2025

Environ. Sci.: Water Res. Technol., 2026, Advance Article

Chitosan-modified biochar enhanced PFAS degradation in UV/sulfite: impact of environmental conditions and applicability across different PFAS

Z. Song, J. He, S. Mai, T. Knappenberger and Y. Olshansky, Environ. Sci.: Water Res. Technol., 2026, Advance Article , DOI: 10.1039/D5EW00661A

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