Atmospheric pressure chemical vapor deposition growth of large-area monolayer ReS2 films for high-performance photodetectors

Abstract

Current research on rhenium disulfide (ReS2) primarily focuses on small-scale thin sheets, but large-scale two-dimensional (2D) monolayer growth is challenging, with poor photodetector performance. Therefore, an in-depth investigation into the growth process of large-scale ReS2, along with exploring approaches to enhance its optoelectronic performance, will overcome limitations and support scalable production for industrial applications. In this study, we optimized the atmospheric-pressure chemical vapor deposition (APCVD) process to achieve centimeter-scale continuous monolayer ReS2 films. Furthermore, annealing treatment significantly enhances the optoelectronic performance of ReS2, with the annealed ReS2 film-based photodetector exhibiting a responsivity (Rλ) of 0.37 A W−1 and an external quantum efficiency (EQE) of 101.94% under 450 nm illumination, while achieving rapid response and decay times of 2.1 s and 2.0 s, respectively. Remarkably, the ReS2 (annealed)/GaSe van der Waals heterojunction photodetector demonstrates unprecedented performance, exhibiting an ultrahigh Rλ of 48.22 A W−1, an exceptional EQE of 1.33 × 104%, along with a high detectivity of 1.20 × 1012 Jones and an impressive on–off ratio of 4.74 × 103. Meanwhile, it maintains a fast response speed. These findings not only provide new insights into the synthesis of ReS2 but also highlight its great potential for next-generation high-performance optoelectronic devices.

Graphical abstract: Atmospheric pressure chemical vapor deposition growth of large-area monolayer ReS2 films for high-performance photodetectors

Article information

Article type
Paper
Submitted
18 Mar 2026
Accepted
10 May 2026
First published
29 May 2026

J. Mater. Chem. C, 2026, Advance Article

Atmospheric pressure chemical vapor deposition growth of large-area monolayer ReS2 films for high-performance photodetectors

Y. Li†, E. Dong†, H. Zheng, Y. Liang, S. Wu, H. Tao, X. Liu, Z. Wei, W. Jiang, T. Lu, Y. Cui and Z. Zhang, J. Mater. Chem. C, 2026, Advance Article , DOI: 10.1039/D6TC00866F

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