Sequential Li-intercalation exfoliation enables high-purity NbSe2 with enhanced electrical and thermal performance

Abstract

This study presents a scalable sequential lithium intercalation exfoliation strategy that significantly enhances the purity, crystallinity, and electrical performance of two-dimensional NbSe2 synthesized from powder precursors. While conventional single-step Li-intercalation methods often lead to partial exfoliation, surface oxidation, and compromised conductivity, the proposed sequential approach enables the progressive removal of oxide-rich residues and promotes the formation of uniform, defect-minimized NbSe2 nanosheets. The resulting material exhibits substantially reduced surface oxide content, improved layer alignment, and achieves up to a ∼6.5× reduction in electrical resistance with stable performance over 14 days under ambient conditions. In particular, the purified NbSe2 thin films demonstrate a rapid temperature rise to ∼150 °C within ∼40 s and spatially uniform Joule-heating behavior without localized hotspots, indicating strong potential for use in flexible and reliable thermal management components. Beyond NbSe2, this methodology offers a generalizable route for producing high-quality, conductive TMDC films, thereby addressing persistent challenges in powder-based 2D material processing and supporting their potential integration into advanced nanoelectronic, optoelectronic, and energy-related technologies.

Graphical abstract: Sequential Li-intercalation exfoliation enables high-purity NbSe2 with enhanced electrical and thermal performance

Article information

Article type
Paper
Submitted
04 Feb 2026
Accepted
22 Mar 2026
First published
13 Apr 2026

J. Mater. Chem. C, 2026, Advance Article

Sequential Li-intercalation exfoliation enables high-purity NbSe2 with enhanced electrical and thermal performance

W. Kim, K. Nam, M. An, J. Kwon, J. Bae and S. Park, J. Mater. Chem. C, 2026, Advance Article , DOI: 10.1039/D6TC00377J

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements