Barrier-thickness-engineered giant magnetotransport and multi-level storage in a CrTe2/Al2S3 van der Waals multiferroic junction

Abstract

van der Waals multiferroic tunnel junctions (MFTJs), which combine tunnel magnetoresistance (TMR) and tunnel electroresistance (TER) effects, are promising building blocks for next-generation, low-power non-volatile memory. In this work, we propose a two-dimensional MFTJ based on a CrTe2/Al2S3/CrTe2 heterostructure and investigate its spin-polarized transport properties using first-principles density functional theory (DFT) with the non-equilibrium Green's function (NEGF) method. By independently controlling the ferroelectric polarization of the Al2S3 barrier and the magnetization of the CrTe2 electrodes, the junction can be switched between multiple non-volatile resistance states. We demonstrate that increasing the barrier thickness from monolayer to bilayer Al2S3 dramatically enhances device performance: the TER ratio increases from 24.8% to 3912%, and the TMR ratio rises from 9.8% to 124.7%. Furthermore, the bilayer barrier MFTJ exhibits six distinct resistance states, enabling multi-level data storage. Under finite bias, the device also manifests a significant spin-filtering effect and a negative differential resistance (NDR) effect. These results highlight the strong potential of the CrTe2/Al2S3/Al2S3/CrTe2 MFTJ for advanced spintronic and multi-state memory applications.

Graphical abstract: Barrier-thickness-engineered giant magnetotransport and multi-level storage in a CrTe2/Al2S3 van der Waals multiferroic junction

Supplementary files

Transparent peer review

To support increased transparency, we offer authors the option to publish the peer review history alongside their article.

View this article’s peer review history

Article information

Article type
Paper
Submitted
21 Nov 2025
Accepted
30 Jan 2026
First published
02 Feb 2026

J. Mater. Chem. C, 2026, Advance Article

Barrier-thickness-engineered giant magnetotransport and multi-level storage in a CrTe2/Al2S3 van der Waals multiferroic junction

Y. Zhu, K. Wang, C. Xie, T. Jiang, Y. Zhang, Z. Ye, X. Wu, H. Tang, X. Sun, T. Zhu, Z. Xu, Z. Feng, L. Xu, W. Lu, Z. Wu and Y. Dai, J. Mater. Chem. C, 2026, Advance Article , DOI: 10.1039/D5TC04126K

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements