Advances in Perovskite/C60 Interface Engineering for Efficiency and Stability in Perovskite/Silicon Tandem Solar Cells

Abstract

Perovskite/silicon tandem solar cells (TSCs) have emerged as a leading photovoltaic technology to surpass the Shockley–Queisser efficiency limit of single-junction devices. In this architecture, the interfacial properties between the perovskite absorber and the electron transport layer (ETL) critically govern charge extraction, non-radiative recombination losses, and long-term operational stability. Among the various ETL materials, fullerene C60 and its derivatives are widely employed owing to their favorable energy-level alignment with perovskites, high electron mobility, and compatibility with low-temperature processing. Nevertheless, non-ideal interfacial contact, interfacial energy-level mismatch, intrinsic defect states, and ion-induced interfacial degradation at the perovskite/C60 heterointerface remain key bottlenecks limiting the efficiency and stability of tandem devices. This review systematically examines recent advances in interfacial engineering strategies at the perovskite/C60 interface, focusing on approaches that suppress phase segregation, passivate interfacial defects, tailor energy-level alignment, and mitigate ion migration. We further summarize the implementation of these strategies in high-efficiency perovskite/silicon TSCs, covering both small-area devices and scalable large-area modules, with particular emphasis on processing compatibility and operational stability. Finally, we discuss the remaining scientific and technological challenges and outline future research directions toward robust, manufacturable, and industry-compatible perovskite/silicon tandem photovoltaics.

Article information

Article type
Review Article
Submitted
10 Feb 2026
Accepted
20 Apr 2026
First published
21 Apr 2026

J. Mater. Chem. A, 2026, Accepted Manuscript

Advances in Perovskite/C60 Interface Engineering for Efficiency and Stability in Perovskite/Silicon Tandem Solar Cells

D. Duan, F. Wang, Q. Li, X. Sun, A. Ng, Q. Tai and H. Hu, J. Mater. Chem. A, 2026, Accepted Manuscript , DOI: 10.1039/D6TA01282E

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