Bridging classical and quantum interpretation of chemical state analysis by XPS/HAXPES to resolve short-range order in amorphous alumina films

Abstract

Probing the local structure and chemistry of wide-bandgap amorphous oxide thin films remains challenging due to the limitations of lab-based spectroscopy. This work integrates X-ray photoelectron spectroscopy (XPS), hard X-ray photoemission spectroscopy (HAXPES), molecular dynamics simulations using machine-learning interatomic potentials, density-functional theory (DFT) calculations, and classical electrostatic modeling of final-state core-ionization effects in Al atoms to uncover the structure and chemistry of amorphous alumina polymorphs made with atomic layer deposition (ALD). DFT calculations using the ΔKohn–Sham method supported the interpretation of final-state effects and validated electrostatic model assumptions. Shifts in the measured Auger parameters were interpreted as extra-atomic relaxation energies, revealing sensitivity to the local coordination environment. Structural disorder and thermal fluctuations were found to govern the distribution of extra-atomic relaxation energies, suggesting that cryo-XPS can isolate and reveal intrinsic structural building blocks of amorphous oxides. Simulated heating and annealing demonstrated that Auger parameter shifts can serve as indicators of phase decomposition in H-supersaturated ALD amorphous alumina. These findings provide a pathway for comprehensive interpretation and predictive modeling of XPS spectra in amorphous wide-bandgap oxides.

Graphical abstract: Bridging classical and quantum interpretation of chemical state analysis by XPS/HAXPES to resolve short-range order in amorphous alumina films

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Article information

Article type
Paper
Submitted
22 Oct 2025
Accepted
11 Feb 2026
First published
11 Mar 2026
This article is Open Access
Creative Commons BY license

J. Mater. Chem. A, 2026, Advance Article

Bridging classical and quantum interpretation of chemical state analysis by XPS/HAXPES to resolve short-range order in amorphous alumina films

S. Gramatte, X. Wang, M. A. Hernández Bertrán, C. Cancellieri, G. Pizzi, D. Prezzi, I. Timrov, O. Politano, I. Utke, L. P. H. Jeurgens and V. Turlo, J. Mater. Chem. A, 2026, Advance Article , DOI: 10.1039/D5TA08586A

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