Holistic Bulk-to-Surface Tailoring of Ni-Rich Cathodes for Unlocking Superior Electrochemical Stability

Abstract

Ni-rich cathodes have revolutionized lithium-ion batteries by delivering high energy density. However, achieving a durable trade-off between capacity and long life remains a formidable challenge, hindered by oxygen loss, irreversible phase transformation, and structural degradation during repeated cycles. Herein, we propose a synchronous bulk-to-surface full-scale modification strategy by integrating multi-site B/Ce bulk doping with a conformal CeO2 surface coating. Boron atoms are successfully incorporated into transition metal (TM) tetrahedral interstitial sites as a covalent "rivet" to suppress detrimental H2-H3 phase transitions and anisotropic strain, thereby effectively inhibiting the intra-particle crack propagation. Concurrently, cerium ions are located at TM octahedral sites, acting as an electron buffer to decrease the concentration of reactive Ni4+ species and stabilize the oxygen lattice. Furthermore, the uniform CeO2 protective layer serves as a robust physical barrier against electrolyte corrosion while effectively scavenging acidic species, reducing TM dissolution, and mitigating interfacial side reactions. The comprehensively regulated NCM83 cathode exhibits exceptional electrochemical performance, maintaining 94.4% capacity retention after 1000 cycles at 1 C in a pouch-type full cell. This study presents an innovative approach that combines an internal multi-site lattice with an external surface structure for developing advanced Ni-rich cathodes.

Supplementary files

Article information

Article type
Edge Article
Submitted
24 Feb 2026
Accepted
14 Mar 2026
First published
16 Mar 2026
This article is Open Access

All publication charges for this article have been paid for by the Royal Society of Chemistry
Creative Commons BY-NC license

Chem. Sci., 2026, Accepted Manuscript

Holistic Bulk-to-Surface Tailoring of Ni-Rich Cathodes for Unlocking Superior Electrochemical Stability

Y. Li, Z. Liu, H. Wang, J. Chen, Z. Gu, J. Deng, G. Liu, K. Huang, S. Zhang, H. Feng, H. Chen, H. He, F. Zhu, L. Hu, H. Hou and X. Ji, Chem. Sci., 2026, Accepted Manuscript , DOI: 10.1039/D6SC01562J

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