Correction: Synthesis of heteroleptic [Sr(ddemap)(tmhd)]2 and its use in atomic layer deposition of low carbon SrO thin films

Yeji Lee; Chanwoo Park; Sangyeon Jeong; Daeun Lim; Jonghyun Kim; Hyeongjun Kim; Eun A Kim; Seong-Yong Cho; Hyobin Yoo; Bo Keun Park; Taek-Mo Chung; Woongkyu Lee

doi:10.1039/D6RA90050J

Correction: Synthesis of heteroleptic [Sr(ddemap)(tmhd)]₂ and its use in atomic layer deposition of low carbon SrO thin films

Yeji Lee,^a Chanwoo Park,^b Sangyeon Jeong,^c Daeun Lim,^ac Jonghyun Kim,^a Hyeongjun Kim,^c Eun A Kim,^d Seong-Yong Cho,^d Hyobin Yoo,^e Bo Keun Park,^b Taek-Mo Chung*^b and Woongkyu Lee*^ac

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* Corresponding authors

^a Department of Electrical Engineering, Myongji University, Yongin 17558, Republic of Korea

^b Thin Film Materials Research Center, Korea Research Institute of Chemical Technology, Daejeon 67447, Republic of Korea
E-mail: tmchung@krict.re.kr

^c Department of Materials Science and Engineering, Soongsil University, Seoul 07040, Republic of Korea
E-mail: woong@ssu.ac.kr

^d Department of Photonics and Nanoelectronics, HYU-KITECH Joint Department, Hanyang University, Ansan 15588, Korea

^e Department of Materials Science and Engineering, Research Institute of Advanced Materials, Seoul National University, Seoul 08826, Republic of Korea

Abstract

Correction for ‘Synthesis of heteroleptic [Sr(ddemap)(tmhd)]₂ and its use in atomic layer deposition of low carbon SrO thin films’ by Yeji Lee et al., RSC Adv., 2026, 16, 4740–4749, DOI: https://doi.org/10.1039/d5ra08373g

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Correction: Synthesis of heteroleptic [Sr(ddemap)(tmhd)]₂ and its use in atomic layer deposition of low carbon SrO thin films

Abstract

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Correction: Synthesis of heteroleptic [Sr(ddemap)(tmhd)]₂ and its use in atomic layer deposition of low carbon SrO thin films

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