Examining Factors Affecting the Schiff base Post-synthetic Modification of UiO-66-NH2 Films by Reactive Inkjet Printing

Abstract

Methods to functionalise metal-organic framework (MOF) films are needed to enhance the performance of these microporous materials in applications ranging across sensors and membranes to microelectronics. Inkjet printing is a technique that offers opportunities for precise chemical functionalisation and structuring of MOF films but is yet to be adopted widely. Here, we take a deeper investigation of reactive inkjet printing (RIJP) for covalent functionalisation of UiO-66-NH₂ films via a well-employed type of post-synthetic modification (PSM) -Schiff base formation. Our findings demonstrate the flexibility for RIJP and reveal several important considerations for MOF film PSM that will enable wide adoption for the field.