From the journal:

Materials Advances

Sulfur-rich polymer with nanoparticles: high refractive index dual-tone photoresist

Xiaofei Qian ORCID logo *ab  and  Tao Liua  

* Corresponding authors

a School of Microelectronics, Fudan University, Shanghai, P. R. China
E-mail: xfqian@fudan.edu.cn

b Fudan Zhangjiang Institute, Shanghai, P. R. China

Abstract

A sulfur-containing polymer was synthesized and the refractive index (RI) reached 1.80 (633 nm) upon incorporation with nano TiO2 particles. Mixtures were formulated as high RI dual-tone photoresists with high transparency by introducing a photoacid generator and crosslinker. The good patterning performance suggests potential applications in optical devices.

Graphical abstract: Sulfur-rich polymer with nanoparticles: high refractive index dual-tone photoresist

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Article information

DOI
https://doi.org/10.1039/D5MA01190F
Article type
Communication
Submitted
15 Oct 2025
Accepted
27 Nov 2025
First published
28 Nov 2025
This article is Open Access
Creative Commons BY-NC license

Mater. Adv., 2026, Advance Article

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Sulfur-rich polymer with nanoparticles: high refractive index dual-tone photoresist

X. Qian and T. Liu, Mater. Adv., 2026, Advance Article , DOI: 10.1039/D5MA01190F

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