No Substrate Required: Electron-Beam-Enabled, Single-Atom-Thick 2D Metals and Metal Oxides

Abstract

Freestanding, single-atom-thick metals and metal oxides, defined here as monolayers suspended without an underlying solid substrate and supported only at their perimeter, represent an extreme two-dimensional (2D) limit that cannot be accessed by exfoliation of van der Waals solids. This review argues that their stability and formation are fundamentally interfacial: the most convincing realizations occur in edge-confined geometries (notably graphene pores) where perimeter anchoring, atom capture and boundary conditions stabilize low-coordination configurations that otherwise relax toward three-dimensional (3D) packing. In this context, the transmission electron microscope operates as an interface reactor, coupling atomicresolution imaging to beam-driven diffusion, selective sputtering and reconstruction, such that fabrication and characterization are inseparable. We organize the literature into three experimentally relevant routes: (I) graphene-pore templating yielding membranes, planar patches and ultranarrow nanoribbons; (II) beam-driven top-down thinning and alloyenabled dealloying concepts that bias reconstruction toward monoatomic remnants; and (III) subtractive beam chemistry converting compound precursors into new monolayers (e.g., oxyhalide → oxide and MoSe₂ → Mo). We set out evidence and reporting standards (quantitative thickness assignment and dose-history reporting) and describe how automation and closed-loop control can translate these atomically thin interfaces from demonstrations to reproducible platforms.

Article information

Article type
Review Article
Submitted
12 Jan 2026
Accepted
04 May 2026
First published
20 May 2026
This article is Open Access
Creative Commons BY license

RSC Appl. Interfaces, 2026, Accepted Manuscript

No Substrate Required: Electron-Beam-Enabled, Single-Atom-Thick 2D Metals and Metal Oxides

A. Bachmatiuk, X. Yang, M. Zdończyk, S. Abrahamczyk, G. S. Martynková and M. Rümmeli, RSC Appl. Interfaces, 2026, Accepted Manuscript , DOI: 10.1039/D6LF00009F

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