The role of sulfur vacancies on FeS2(100) in NO dissociative adsorption: a combined in situ SR-XPS and DFT calculation study

Abstract

Sulfur vacancies (Svacs) are known to change the reactivity of transition metal sulfides, but their mechanistic role in small-molecule activation remains poorly understood. Here, we carried out synchrotron radiation X-ray photoelectron spectroscopy (SR-XPS) and dispersion-corrected density functional theory (DFT-D3) calculations to elucidate how Svac sites on FeS2(100) surfaces promote nitric oxide (NO) dissociation. SR-XPS results reveal progressive Fe oxidation, Fe–N formation, and the growth of adsorbed oxygen species as a function of NO exposure. The N/O atomic ratio evolution suggests recombinative N2 desorption from the surface. DFT-D3 calculations show that the dissociative adsorption of NO is thermodynamically more stable on the defective FeS2(100) surface than on the defect-free surface. Based on the Brønsted–Evans–Polanyi relationship, dissociative adsorption of NO may be kinetically favorable on the defective FeS2(100) surface. Two possible pathways are proposed: (1) O–O bond formation at Svac sites and (2) oxygen-induced S–S bond cleavage to yield O–S species and new Smono. The present experimental–computational study demonstrates the atomic-level role of Svacs in NO activation on FeS2(100) and provides chemical insight into defect engineering of sulfide-based catalysts for selective nitrogen oxide conversion.

Graphical abstract: The role of sulfur vacancies on FeS2(100) in NO dissociative adsorption: a combined in situ SR-XPS and DFT calculation study

Supplementary files

Article information

Article type
Paper
Submitted
08 Feb 2026
Accepted
16 May 2026
First published
03 Jun 2026
This article is Open Access
Creative Commons BY-NC license

Phys. Chem. Chem. Phys., 2026, Advance Article

The role of sulfur vacancies on FeS2(100) in NO dissociative adsorption: a combined in situ SR-XPS and DFT calculation study

W. Hsiao, F. Ozaki, K. Mukai, S. Tanaka, D. Nishio-Hamane, M. Fukuda, T. Ozaki and J. Yoshinobu, Phys. Chem. Chem. Phys., 2026, Advance Article , DOI: 10.1039/D6CP00466K

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