First-Principles Investigation of Water Adsorption and Dissociation on the Al/Y-doped Mg (0001) Surface

Abstract

The poor corrosion resistance of Mg alloys affects their large-scale application. The cathodic hydrogen evolution reaction (HER) is one of the reasons affecting the rapid corrosion rate of Mg alloys, which mainly involves the adsorption and dissociation of water molecules. During these processes, H and OH were gradually formed and adsorbed on the Mg surface. This caused the H atoms that were attracted to each other to form H2 and escape from the surface, while OH remained on the surface to form Mg(OH)2 with the Mg atom, which has a significant impact on the Mg corrosion. In this work, the effects of Al and Y elements on the adsorption and dissociation of water on the Mg (0001) surface have been investigated by first-principles calculations. By calculating the adsorption energy of H2O, H-OH, OH, and the Hydrolysis reaction enthalpy, we determined their stable adsorption sites and the most likely dissociation pathway of water molecules on the surface. In addition, by calculating the charge distribution state of the water adsorption and dissociation process on the Al/Y-doped Mg (0001) surface, we revealed the influence of doped atoms (Al, Y) on the stable adsorption sites of water molecules on the Mg (0001) surface. The results indicated that doped atoms could redistribute surface electrons, which changed the adsorption energies and sites of H2O, H, and OH during the water adsorption and dissociation process, regulating the HER of Mg. Interestingly, the Y element can promote the adsorption and dissociation of water molecules on the Y-doped Mg (0001) surface, inducing the formation of Y(OH)3 and Mg(OH)2 to enhance the Mg corrosion resistance.

Supplementary files

Article information

Article type
Paper
Submitted
18 Nov 2025
Accepted
23 May 2026
First published
25 May 2026

Phys. Chem. Chem. Phys., 2026, Accepted Manuscript

First-Principles Investigation of Water Adsorption and Dissociation on the Al/Y-doped Mg (0001) Surface

H. Ding, L. Hou, X. Yi, Y. Chen, C. Zhang, M. Pan, Q. Dang, Z. Wei, X. Wang and G. Liu, Phys. Chem. Chem. Phys., 2026, Accepted Manuscript , DOI: 10.1039/D5CP04459F

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