Data-guided rational design of additives for halogenation of highly fluorinated naphthalenes: Integrating fluorine chemistry and machine learning

Abstract

Highly fluorinated aromatic compounds exhibit unique electronic structures, however their selective transformation remains a longstanding challenge. Halogenation of F7 naphthalene previously required low temperatures (-40 to 0 °C) for high yields, while room-temperature reactions suffered from side reactions and decomposition. Here we present a dataguided framework for rational additive design enabling efficient halogenation under ambient conditions. Screening 25 functional additives revealed distinct groups, with effective ones affording halogenated products in yields above 50% and recovering in high rates. Machine learning models built from DFT-derived descriptors achieved strong predictive performance (R² = 0.90, RMSE = 10.9). Feature importance and SHAP analyses clarified the design criteria-moderately balanced functional-group charges and non-negative aromatic contributions-as critical for reactivity. Guided by these criteria, a chlorine-substituted additive, 1-chloro-4-(ethoxymethyl)benzene (3a), was designed, predicted to give >99% yield, and experimentally validated to deliver iodinated product in 98% yield with 96% additive recovery at room temperature. Moreover, additive 3a was effective in iodination, bromination, and chlorination, demonstrating the generality of the design principle. This study advances additive development from empirical trial-and-error to a predictive, machine learningenabled strategy, offering guidelines for selective transformations of perfluorinated arenes.

Supplementary files

Article information

Article type
Paper
Submitted
15 Sep 2025
Accepted
20 Feb 2026
First published
20 Feb 2026
This article is Open Access
Creative Commons BY-NC license

Phys. Chem. Chem. Phys., 2026, Accepted Manuscript

Data-guided rational design of additives for halogenation of highly fluorinated naphthalenes: Integrating fluorine chemistry and machine learning

N. Ohtsuka, M. Z. Mohd Aris, T. Suzuki and N. Momiyama, Phys. Chem. Chem. Phys., 2026, Accepted Manuscript , DOI: 10.1039/D5CP03554F

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