Crystal Engineering of Manganese Nitride Thin Film Electrodes for All-Nitride Asymmetric Supercapacitors
Abstract
Crystal engineering of magnetron sputtered manganese nitride thin film electrodes is demonstrated. Mn3N2 electrodes deliver a high areal capacitance of 66.7 mF cm⁻², attributed to favorable K+ adsorption, enhanced charge transfer and lower migration barrier. An asymmetric Mn3N2//VN supercapacitor achieves an energy density of 153.1 mWh cm⁻3 and excellent cycling stability.
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