Zeta Potential Transition Correlates with Optimal DNA Origami Silicification Temperature

Abstract

DNA origami templates enable precise construction of inorganic nanostructures via silicification, yet optimal reaction conditions are often determined empirically. Here, we demonstrate that the temperature-dependent evolution of DNA origami zeta potential provides a simple, design-independent predictor of favourable silicification. Four distinct architectures, square, triangle, 14-helix bundle, and ring, were examined, revealing that the highest silicification thickness is achieved near the temperature at which the zeta potential distribution begins transitioning from unimodal to bimodal, while maintaining a relatively low thickness coefficient of variation (Thickness CV), which is used as a measure of interparticle uniformity in silicification. Above this range, conformational heterogeneity increases, reducing silica deposition efficiency. Molecular dynamics simulations indicate that moderate thermal fluctuations expose additional binding sites while preserving structural integrity, whereas excessive heating destabilizes helices. This approach offers a rapid, predictive strategy to guide reproducible inorganic coating across diverse DNA nanostructures.

Supplementary files

Transparent peer review

To support increased transparency, we offer authors the option to publish the peer review history alongside their article.

View this article’s peer review history

Article information

Article type
Communication
Submitted
10 Apr 2026
Accepted
20 May 2026
First published
22 May 2026

Chem. Commun., 2026, Accepted Manuscript

Zeta Potential Transition Correlates with Optimal DNA Origami Silicification Temperature

T. Ye, Z. Liang, Y. Wang, L. Cai, B. Li, M. Li, X. Liu and S. Jia, Chem. Commun., 2026, Accepted Manuscript , DOI: 10.1039/D6CC02200F

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements