From the journal:

Chemical Communications

Photo-crosslinkable diazirine additives for direct photolithography of PEDOT:PSS

Mingyuan Sun,†a   Rui-Lin Chai, ORCID logo †a   Songhao Li,a   Yiming Li,a   Weizhen Li,a   Ziyu Song,a   Xue Zheng,a   Yuan Yuan ORCID logo abc  and  Yi-Xuan Wang ORCID logo *abc  

* Corresponding authors

a State Key Laboratory of Advanced Materials for Intelligent Sensing, Key Laboratory of Organic Integrated Circuit, Ministry of Education & Tianjin Key Laboratory of Molecular Optoelectronic Sciences, Department of Chemistry, School of Science, Tianjin University, Tianjin 300072, P. R. China
E-mail: yx_wang@tju.edu.cn

b Collaborative Innovation Center of Chemical Science and Engineering, Tianjin 300072, P. R. China

c Haihe Laboratory of Sustainable Chemical Transformations, Tianjin 300192, P. R. China

Abstract

A diazirine-based crosslinker enables the direct photolithography of PEDOT:PSS at a low loading (1 : 10 mass ratio). UV exposure yields robust covalent carbene-insertion networks that survive water development, achieving high-fidelity features with resolutions below 20 µm. Subsequent acid post-treatment affords highly ordered polymer networks with an exceptional film conductivity of 2258 S cm−1.

Graphical abstract: Photo-crosslinkable diazirine additives for direct photolithography of PEDOT:PSS

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Article information

DOI
https://doi.org/10.1039/D6CC01500J
Article type
Communication
Submitted
12 Mar 2026
Accepted
18 May 2026
First published
26 May 2026

Chem. Commun., 2026, Advance Article

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Photo-crosslinkable diazirine additives for direct photolithography of PEDOT:PSS

M. Sun, R. Chai, S. Li, Y. Li, W. Li, Z. Song, X. Zheng, Y. Yuan and Y. Wang, Chem. Commun., 2026, Advance Article , DOI: 10.1039/D6CC01500J

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