Novel Ru(II)-photo-antibiotics for the development of infection-resistant mask coatings

Arif Ali Mandal; Saurav Kumar; Srijan Singh; Apurba Mandal; Samya Banerjee; Prodyut Dhar

doi:10.1039/D5CC06235G

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Novel Ru(ii)-photo-antibiotics for the development of infection-resistant mask coatings

Arif Ali Mandal,†^a Saurav Kumar,†^b Srijan Singh,^a Apurba Mandal,^a Samya Banerjee

*^a and Prodyut Dhar

*^b

Author affiliations

* Corresponding authors

^a Department of Chemistry, Indian Institute of Technology (BHU), Varanasi, Uttar Pradesh 221005, India
E-mail: samya.chy@iitbhu.ac.in

^b School of Biochemical Engineering, Indian Institute of Technology (BHU), Varanasi, Uttar Pradesh 221005, India
E-mail: prodyut.bce@iitbhu.ac.in

Abstract

Four novel Ru(II)-photoantibiotics (Ru1–Ru4) were developed to produce infection-resistant self-cleaning mask coatings. These photoantibiotics eliminate bacterial infections by generating oxidative stress and photothermal effects upon exposure to visible light (400–700 nm) with tuneable surface hydrophobicity.

This article is part of the themed collection: 2026 Emerging Investigator Collection

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DOI: https://doi.org/10.1039/D5CC06235G
Article type: Communication
Submitted: 01 Nov 2025
Accepted: 08 Dec 2025
First published: 08 Dec 2025

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Chem. Commun., 2026, Advance Article

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Novel Ru(II)-photo-antibiotics for the development of infection-resistant mask coatings

A. A. Mandal, S. Kumar, S. Singh, A. Mandal, S. Banerjee and P. Dhar, Chem. Commun., 2026, Advance Article , DOI: 10.1039/D5CC06235G

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Novel Ru(ii)-photo-antibiotics for the development of infection-resistant mask coatings

Abstract

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Novel Ru(II)-photo-antibiotics for the development of infection-resistant mask coatings

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