From the journal:

Chemical Communications

Novel Ru(ii)-photo-antibiotics for the development of infection-resistant mask coatings

Arif Ali Mandal,†a   Saurav Kumar,†b   Srijan Singh,a   Apurba Mandal,a   Samya Banerjee ORCID logo *a  and  Prodyut Dhar ORCID logo *b  

* Corresponding authors

a Department of Chemistry, Indian Institute of Technology (BHU), Varanasi, Uttar Pradesh 221005, India
E-mail: samya.chy@iitbhu.ac.in

b School of Biochemical Engineering, Indian Institute of Technology (BHU), Varanasi, Uttar Pradesh 221005, India
E-mail: prodyut.bce@iitbhu.ac.in

Abstract

Four novel Ru(II)-photoantibiotics (Ru1–Ru4) were developed to produce infection-resistant self-cleaning mask coatings. These photoantibiotics eliminate bacterial infections by generating oxidative stress and photothermal effects upon exposure to visible light (400–700 nm) with tuneable surface hydrophobicity.

Graphical abstract: Novel Ru(ii)-photo-antibiotics for the development of infection-resistant mask coatings

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Article information

DOI
https://doi.org/10.1039/D5CC06235G
Article type
Communication
Submitted
01 Nov 2025
Accepted
08 Dec 2025
First published
08 Dec 2025

Chem. Commun., 2026, Advance Article

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Novel Ru(II)-photo-antibiotics for the development of infection-resistant mask coatings

A. A. Mandal, S. Kumar, S. Singh, A. Mandal, S. Banerjee and P. Dhar, Chem. Commun., 2026, Advance Article , DOI: 10.1039/D5CC06235G

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