Memristive hysteresis and stacking-fault-induced semiconductor to metal transition in sulfur-modified multiwall carbon nanotubes

Abstract

The recent identification of superconductive phenomena in few and multi-layer graphene systems have attracted significant attention. Superconductivity has been reported to occur also in pyrolytic graphite where, together with the narrow-gap semiconducting Bernal (ABA) phase, a critical role is played by stacking-faults which behave either as metallic-like and/or granular superconducting regions. Here we investigate the current vs voltage properties of stacking-faults nucleated in multiwall carbon nanotubes (CNTs) by annealing with diluted amounts of sulfur. By employing a combination of atomic force microscopy (AFM) and high-resolution transmission electron microscopy (HRTEM) we identify an interplay of semiconducting and metallic components in coexistence with memristive responses, with a local semiconducting to metallic transition occurring in the stacking-fault regions. The observed transition in the CNT-structure (the stacking-fault) is ascribed to a localized sulfur-induced modification of the graphitic stacking-order and partial amorphization of the CNT-walls, leading to a local structural-collapse of the CNT. Comparative investigations performed on highly-crystalline graphitic multiwall CNTs and multilayered carbon nano-onions (with a turbostratic-structure) revealed an important interplay of contributions arising from Bernal and turbostratic graphite-phases. This translates into a competing semiconducting and metallic behaviour in coexistence with the observed memristive characteristics.

Supplementary files

Article information

Article type
Paper
Submitted
13 Jul 2025
Accepted
13 Sep 2025
First published
15 Sep 2025

J. Mater. Chem. C, 2025, Accepted Manuscript

Memristive hysteresis and stacking-fault-induced semiconductor to metal transition in sulfur-modified multiwall carbon nanotubes

Y. Liu, S. Wang, J. Guo, H. Wu, L. Lei, J. Borowiec, O. Odunmbaku, X. Guo and F. Boi, J. Mater. Chem. C, 2025, Accepted Manuscript , DOI: 10.1039/D5TC02657A

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