Issue 9, 2025

Excellent electromagnetic wave absorption performances of FeCoNiAlTix high-entropy alloys with superior oxidation resistance

Abstract

The rapid advancement of electromagnetic wave (EMW) technology has significantly increased the military's demand for anti-reconnaissance measures and the need to mitigate electromagnetic interference in daily life. High-entropy alloys (HEAs) have garnered widespread attention as a new generation of absorbers due to their tunable EMW absorption properties and strong stability. Among them, FeCoNiAl-based HEAs are known for their strong magnetic loss capabilities and moderate oxidation resistance, which are critical for the regulation of microwave absorption performance and adaptation to high-temperature environments. However, limitations such as a narrow effective absorption bandwidth (EAB), a narrow slow-oxidation temperature range, and relatively high density have been reported in current studies. In this work, as a lightweight and corrosion-resistant element with a large atomic radius and low valence electron count, Ti was introduced to induce a phase transformation of the alloy structure toward a BCC phase with superior magnetic loss capabilities, while reducing density and improving oxidation resistance. FeCoNiAlTi0.6 prepared via high-energy ball milling exhibits excellent EMW absorption performance and oxidation resistance, achieving the minimum reflection loss (RLmin) of −66.38 dB with a thickness of 1.68 mm, and the widest EAB of 6.11 GHz, covering a slow oxidation temperature range of 0 to 900 °C.

Graphical abstract: Excellent electromagnetic wave absorption performances of FeCoNiAlTix high-entropy alloys with superior oxidation resistance

Supplementary files

Article information

Article type
Paper
Submitted
13 Sep 2024
Accepted
03 Jan 2025
First published
20 Jan 2025

J. Mater. Chem. C, 2025,13, 4583-4593

Excellent electromagnetic wave absorption performances of FeCoNiAlTix high-entropy alloys with superior oxidation resistance

Y. Wang, L. Fang, C. Xu, X. Chen, Z. Lu, G. Xu, L. Yang, Y. Ouyang and X. Tao, J. Mater. Chem. C, 2025, 13, 4583 DOI: 10.1039/D4TC03932G

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