Atomic layer deposition of a thin TiO2 layer on nickel-rich cathode NCM83 for improved cycling stability

Abstract

Nickle-rich layered oxides (NCMs) are promising cathode materials for high energy-density lithium-ion batteries (LIBs). However, NCMs suffer from poor cycling stability because of severe interfacial side reactions and phase transitions during cycling. Here, we show that by coating a thin and uniform layer of titanium dioxide (TiO2) on the surface of NCM83 (LiNi0.83Co0.11Mn0.06O2) using the atomic layer deposition (ALD) method, its cycling stability is significantly improved with 87.3% capacity retention after 100 cycles at 1C, in sharp contrast to NCM83 without TiO2 coating with only 44.3% capacity retention under the same electrochemical measurement conditions. XPS and ToF-SIMS characterization results reveal that the coated TiO2 layer promotes the formation of a LiF-rich stable cathode/electrolyte interphase (CEI), which effectively suppresses interfacial side reactions and mitigates phase transitions. In-situ XRD characterization results show that the TiO2 coating layer regulates the phase transition process due to mechanical confinement effects, which alleviates crystal distortion and stress accumulation. This work offers an effective approach to modifying nickel-rich cathode materials for high energy-density LIBs.

Supplementary files

Transparent peer review

To support increased transparency, we offer authors the option to publish the peer review history alongside their article.

View this article’s peer review history

Article information

Article type
Paper
Submitted
28 Mar 2025
Accepted
26 May 2025
First published
28 May 2025

J. Mater. Chem. A, 2025, Accepted Manuscript

Atomic layer deposition of a thin TiO2 layer on nickel-rich cathode NCM83 for improved cycling stability

C. Liu, D. Li, S. Zhao, H. Li, F. Li, G. Zeng, H. Chen, C. Wang and X. S. Zhao, J. Mater. Chem. A, 2025, Accepted Manuscript , DOI: 10.1039/D5TA02510A

To request permission to reproduce material from this article, please go to the Copyright Clearance Center request page.

If you are an author contributing to an RSC publication, you do not need to request permission provided correct acknowledgement is given.

If you are the author of this article, you do not need to request permission to reproduce figures and diagrams provided correct acknowledgement is given. If you want to reproduce the whole article in a third-party publication (excluding your thesis/dissertation for which permission is not required) please go to the Copyright Clearance Center request page.

Read more about how to correctly acknowledge RSC content.

Social activity

Spotlight

Advertisements