Resonant defect states of the SnO2:Ta transparent conductive oxide revealed by excitation wavelength-dependent Raman spectroscopy and hybrid functional DFT calculations†
Abstract
Excitation wavelength-dependent Raman spectroscopy, optical spectroscopy, and density functional theory (DFT) calculations with hybrid functionals were used to analyse the electronic structure of defects in SnO2:Ta (1.25 at% Ta) transparent conductive oxide thin films. Based on the Raman excitation profiles of the characteristic D1 and D2 defect modes of two tin vacancy VSn-type defects and one oxygen interstitial Oi-type defect, we derived the corresponding defect-induced electronic transitions of the involved defect states. DFT calculations revealed additional density-of-states for the three point defects at the top of the valence band (VB) in comparison to defect-free SnO2 and SnO2:Ta. The largest distortion of the VB electronic structure was caused by the VSn-type defect with the farthest possible distance from the Ta dopant in the studied 96-atom supercell, and the smallest distortion was caused by the Oi-type defect. Accordingly, the amount of VB splitting showed a reverse order to the electronic transition energies. From the projected defect-density-of-states, we found a delocalized nature of the VSn-type defects and a localized nature of the Oi-type defect, accounting for the different degrees of distortion of the SnO2:Ta electronic structure. Based on these complementary experimental and theoretical results, the electronic structure of point defects in the SnO2:Ta transparent conductive oxide was elucidated in detail. Thus, the proposed approach has great potential to resolve the ongoing controversy about point defects in SnO2.