Issue 14, 2025

Beryllium dinitride monolayer: a multifunctional direct bandgap anisotropic semiconductor containing polymeric nitrogen with oxygen reduction catalysis and potassium-ion storage capability

Abstract

Searching for two-dimensional multifunctional polynitride materials with novel properties and practical applications presents an attractive challenge. The global energy minimum of the beryllium dinitride monolayer (α-2D-BeN2) was predicted using a global structure search method and first-principles theory. With penta-, hexa-, and hepta-atomic rings and an N4 tetramer in its planar anisotropic structure, α-2D-BeN2 monolayer exhibited lattice dynamic stability, excellent thermal stability, a direct bandgap of 1.82 eV, high carrier mobilities, visible light absorption, a large in-plane Poisson's ratio ranging from 0.228 to 0.368, promising oxygen reduction catalysis, and outstanding potassium storage capability with an ultrahigh specific capacity (2895 mA h g−1), a good voltage range (0.280–0.008 V), and a low migration barrier energy (0.109–0.146 eV). Therefore, the α-2D-BeN2 monolayer is expected to be an anisotropic multifunctional material with potential applications in various fields, such as semiconductors, visible-light detectors, donors in solar cells, ductile materials, iontronic devices, and potassium-ion anode materials, thereby expanding the possibilities for polynitride materials.

Graphical abstract: Beryllium dinitride monolayer: a multifunctional direct bandgap anisotropic semiconductor containing polymeric nitrogen with oxygen reduction catalysis and potassium-ion storage capability

Supplementary files

Article information

Article type
Paper
Submitted
03 Dec 2024
Accepted
24 Feb 2025
First published
25 Feb 2025
This article is Open Access
Creative Commons BY-NC license

J. Mater. Chem. A, 2025,13, 10214-10223

Beryllium dinitride monolayer: a multifunctional direct bandgap anisotropic semiconductor containing polymeric nitrogen with oxygen reduction catalysis and potassium-ion storage capability

S. Ni, J. Jiang, W. Wang, X. Wu, Z. Zhuo and Z. Wang, J. Mater. Chem. A, 2025, 13, 10214 DOI: 10.1039/D4TA08565E

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