Issue 27, 2025, Issue in Progress

First-principles investigations of electronic property modulation in the FeCl3/MoSi2N4 heterojunction by strain, interlayer distance and vertical electric field variation

Abstract

This study investigated the changes in the electronic properties of the FeCl3/MoSi2N4 heterostructure by modulating interlayer distance, in-plane strain, and external electric field. The results indicated that the FeCl3/MoSi2N4 van der Waals heterostructure (vdWH) is an indirect band gap semiconductor with a band gap of 1.21/2.21 eV, as determined by a PBE/HSE06 calculations, and forms a type-I heterojunction. The equilibrium interlayer distance (ΔD) is 3.35 Å and altering it results in a decrease in the band gap. Subsequently, a biaxial strain (ε) was applied to the heterostructure. With compressive strain, the band gap shows a linear decrease. When ε = −4%, the material changes from semiconductor to metallic state. Under tensile strains ranging from 1 to 3%, the band gap sharply decreases from 0.89 to 0.22 eV. Under a vertical external electric field in the −0.7 to 0.8 V Å−1 range, the band gap stabilizes at around 0.9 eV. Notably, at −0.8 V Å−1, the band gap reaches zero.

Graphical abstract: First-principles investigations of electronic property modulation in the FeCl3/MoSi2N4 heterojunction by strain, interlayer distance and vertical electric field variation

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Article information

Article type
Paper
Submitted
07 Apr 2025
Accepted
16 Jun 2025
First published
23 Jun 2025
This article is Open Access
Creative Commons BY-NC license

RSC Adv., 2025,15, 21311-21325

First-principles investigations of electronic property modulation in the FeCl3/MoSi2N4 heterojunction by strain, interlayer distance and vertical electric field variation

X. Chen, S. Su, X. Wang, X. Chen, S. A. Ahmad, L. Xu and W. Zhang, RSC Adv., 2025, 15, 21311 DOI: 10.1039/D5RA02387D

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